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FUJIBO HOLDINGS INC

Overview
  • Total Patents
    567
  • GoodIP Patent Rank
    5,297
  • Filing trend
    ⇧ 13.0%
About

FUJIBO HOLDINGS INC has a total of 567 patent applications. It increased the IP activity by 13.0%. Its first patent ever was published in 1999. It filed its patents most often in Japan, WIPO (World Intellectual Property Organization) and Taiwan. Its main competitors in its focus markets machine tools, semiconductors and macromolecular chemistry and polymers are JH RHODES COMPANY INC, SHANDONG NORTH MODERN CHEMISTRY INDUSTRY CO LTD and KPX CHEMICAL CO LTD.

Patent filings per year

Chart showing FUJIBO HOLDINGS INCs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Matsuoka Ryuma 114
#2 Miyazawa Fumio 95
#3 Tateno Teppei 93
#4 Miyasaka Hirohito 85
#5 Kurihara Hiroshi 69
#6 Takagi Masataka 69
#7 Takahashi Daisuke 48
#8 Itoyama Mitsunori 47
#9 Kume Takahiro 45
#10 Tokushige Shin 43

Latest patents

Publication Filing date Title
WO2021065619A1 Polishing pad and method for manufacturing polished product
WO2021065575A1 Polishing pad and method for manufacturing same
JP2020163562A Polishing pad
JP2020163563A Abrasive pad and polished product manufacturing method
TW202022043A Polishing pad and process for producing polished article
JP2020055101A Polishing pad and manufacturing method for polished work-piece
JP2020055102A Polishing pad and manufacturing method for polished work-piece
JP2021003790A Polishing pad
JP2020163536A Abrasive pad
JP2020163537A Abrasive pad
JP2020157449A Holding pad
JP2020157458A Holding pad and method of manufacturing the same
JP2020157456A Holding pad
JP2020157451A Holding pad
JP2020157448A Holding pad and method for manufacturing the same
JP2020157435A Polishing pad
JP2020157431A Polishing pad, method for producing polishing pad, method for polishing surface of optical material or semiconductor material, and method for evaluating polishing pad
JP2020157432A Polishing pad, method for producing polishing pad, method for polishing surface of optical material or semiconductor material, and method for evaluating polishing pad
JP2020157429A Polishing pad
JP2020157415A Polishing pad