| # | Country | Total Patents | |
|---|---|---|---|
| #1 | United States | 15 | |
| #2 | EPO (European Patent Office) | 4 | |
| #3 | Republic of Korea | 4 | |
| #4 | WIPO (World Intellectual Property Organization) | 4 | |
| #5 | Australia | 1 |
| # | Industry | |
|---|---|---|
| #1 | Measurement | |
| #2 | Semiconductors | |
| #3 | Optics |
| # | Technology | |
|---|---|---|
| #1 | Analysing materials | |
| #2 | Semiconductor devices | |
| #3 | Measuring electric variables | |
| #4 | Nonlinear optics | |
| #5 | Optical systems | |
| #6 | Measuring length, angles and areas | |
| #7 | Measuring light |
| # | Name | Total Patents |
|---|---|---|
| #1 | Koldiaev Viktor | 19 |
| #2 | Kryger Marc | 14 |
| #3 | Changala John | 14 |
| #4 | Lei Ming | 8 |
| #5 | Changala John Paul | 6 |
| #6 | Shi Jianing | 6 |
| #7 | Kryger Marc Christopher | 5 |
| #8 | Hunt Jeffrey H | 1 |
| Publication | Filing date | Title |
|---|---|---|
| KR20210021308A | Design of the second harmonic generation (SHG) optical inspection system | |
| WO2019210265A1 | Systems and methods for determining characteristics of semiconductor devices | |
| KR20170092573A | Systems for Parsing Material Properties from within SHG Signals | |
| KR20170005015A | Wafer metrology technologies |