| # | Country | Total Patents | |
|---|---|---|---|
| #1 | Taiwan | 5 | |
| #2 | EPO (European Patent Office) | 2 | |
| #3 | Republic of Korea | 2 | |
| #4 | United States | 2 | |
| #5 | China | 1 | |
| #6 | Japan | 1 |
| # | Industry | |
|---|---|---|
| #1 | Macromolecular chemistry and polymers | |
| #2 | Optics | |
| #3 | Machines | |
| #4 | Organic fine chemistry |
| # | Name | Total Patents |
|---|---|---|
| #1 | Barr Robert K | 8 |
| #2 | Anzures Edgardo | 5 |
| #3 | Lundy Daniel E | 4 |
| #4 | Johnson Todd | 3 |
| #5 | Koes Thomas A | 3 |
| #6 | Edgardo Anzures | 2 |
| #7 | Shelnut James G | 1 |
| #8 | Barr Robert Klemens | 1 |
| #9 | Daniel Lundy E | 1 |
| #10 | Lundy Daniel Edward | 1 |
| Publication | Filing date | Title |
|---|---|---|
| JP2005257924A | Dry film photoresist | |
| US2004063026A1 | Dry film photoresist | |
| EP1209528A1 | Photoresist composition |