| # | Country | Total Patents | |
|---|---|---|---|
| #1 | WIPO (World Intellectual Property Organization) | 6 | |
| #2 | Germany | 5 | |
| #3 | EPO (European Patent Office) | 5 | |
| #4 | Republic of Korea | 4 | |
| #5 | United States | 3 | |
| #6 | China | 2 | |
| #7 | Australia | 1 | |
| #8 | Canada | 1 | |
| #9 | Norway | 1 |
| # | Industry | |
|---|---|---|
| #1 | Semiconductors | |
| #2 | Surface technology and coating | |
| #3 | Thermal processes | |
| #4 | Packaging and shipping | |
| #5 | Machine tools | |
| #6 | Audio-visual technology | |
| #7 | Measurement | |
| #8 | Chemical engineering | |
| #9 | Mechanical elements |
| # | Name | Total Patents |
|---|---|---|
| #1 | Hartung Robert Michael | 22 |
| #2 | Voeller Hans Ulrich | 8 |
| #3 | Keim Uwe | 6 |
| #4 | Mueller Rolf | 5 |
| #5 | Voller Hans Ulrich | 4 |
| #6 | Michael Hartung Robert | 4 |
| #7 | Voelk Hans-Peter | 3 |
| #8 | Keller Andreas | 2 |
| #9 | Uwe Keim | 2 |
| #10 | Voelk Hans Peter | 1 |
| Publication | Filing date | Title |
|---|---|---|
| DE102009032151A1 | Coating articles with oxygen barriers in a reaction chamber of a chemical vapor deposition device under normal pressure, comprises initially admixing undried air to gas stream of silicon and monocarbonic acid with a given steam pressure | |
| DE102009006932A1 | Arrangement and method for gas-tight sealing of OLED components | |
| KR20100053566A | Arrangement for the contactless transport of flat substrates | |
| AU2007321185A1 | Method and arrangement for heat treatment of substrates | |
| DE102007024266A1 | Method for controlling the process gas concentration | |
| DE102006027027A1 | soldering |