BARWICZ TYMON has a total of 14 patent applications. Its first patent ever was published in 2005. It filed its patents most often in United States and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets optics, semiconductors and micro-structure and nano-technology are TOTO KK, HASEGAWA MASAHIRO and EGIDE SA.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 11 | |
#2 | WIPO (World Intellectual Property Organization) | 3 |
# | Industry | |
---|---|---|
#1 | Optics | |
#2 | Semiconductors | |
#3 | Micro-structure and nano-technology | |
#4 | Machine tools | |
#5 | Audio-visual technology | |
#6 | Machines | |
#7 | Measurement |
# | Name | Total Patents |
---|---|---|
#1 | Barwicz Tymon | 14 |
#2 | Popovic Milos | 3 |
#3 | Taira Yoichi | 2 |
#4 | Dang Bing | 2 |
#5 | Sekaric Lidija | 2 |
#6 | Numata Hidetoshi | 2 |
#7 | Cohen Guy | 1 |
#8 | Kurtz Dan | 1 |
#9 | Guha Supratik | 1 |
#10 | Sleight Jeffrey W | 1 |
Publication | Filing date | Title |
---|---|---|
US2013283584A1 | Assembly of electronic and optical devices | |
US8534927B1 | Flexible fiber to wafer interface | |
US2013156365A1 | Fiber to wafer interface | |
US2012280203A1 | Transparent photodetector | |
US2011207335A1 | Constrained oxidation of suspended micro- and nano-structures | |
US2010295020A1 | Robust top-down silicon nanowire structure using a conformal nitride | |
US2010255680A1 | Top-down nanowire thinning processes | |
US2008014534A1 | Microphotonic maskless lithography | |
WO2006058150A2 | Multilevel fabrication processing by functional regrouping of material deposition, lithography, and etching |