| # | Country | Total Patents | |
|---|---|---|---|
| #1 | China | 11 |
| # | Industry | |
|---|---|---|
| #1 | Macromolecular chemistry and polymers | |
| #2 | Optics | |
| #3 | Surface technology and coating | |
| #4 | Audio-visual technology | |
| #5 | Semiconductors | |
| #6 | Machines |
| # | Name | Total Patents |
|---|---|---|
| #1 | Iizuka Yasuhito | 3 |
| #2 | Adachi Hiroaki | 2 |
| #3 | Shimoda Koichiro | 2 |
| #4 | Sasaki Yoro | 2 |
| #5 | Yamamoto Masaki | 2 |
| #6 | Matsuda Takayuki | 2 |
| #7 | Moriuchi Kiyoaki | 1 |
| #8 | Yoshida Mayuki | 1 |
| #9 | Shibui Satoshi | 1 |
| #10 | Kanada Takayuki | 1 |
| Publication | Filing date | Title |
|---|---|---|
| CN106104381A | Photosensitive polymer combination, the manufacture method of cured relief pattern and semiconductor device | |
| CN105584149A | Resin composition, layered product, multilayered printed wiring board, multilayered flexible wiring board, and process for producing same |