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ARDENNE ASSET GMBH & CO KG VON

Overview
  • Total Patents
    190
  • GoodIP Patent Rank
    8,742
  • Filing trend
    ⇧ 40.0%
About

ARDENNE ASSET GMBH & CO KG VON has a total of 190 patent applications. It increased the IP activity by 40.0%. Its first patent ever was published in 2010. It filed its patents most often in Germany, United States and China. Its main competitors in its focus markets surface technology and coating, electrical machinery and energy and environmental technology are JET PROCESS CORP, ARDENNE GMBH VON and HONDA KAZUYOSHI.

Patent filings per year

Chart showing ARDENNE ASSET GMBH & CO KG VONs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Vieluf Maik 30
#2 Hentschel Michael 18
#3 Reinhold Ekkehart 18
#4 Hofmann Michael 15
#5 Dsaak Torsten 15
#6 Meyer Thomas 14
#7 Gottsmann Lutz 13
#8 Faber Jörg 12
#9 Wehner Uwe 12
#10 Linss Volker 11

Latest patents

Publication Filing date Title
DE102019129632A1 Vacuum coupling arrangement and vacuum arrangement
DE102019129057A1 Coupling device, vacuum arrangement, method and control device
EP3812481A1 Evaporation arrangement, control device and method
DE102019125219A1 Vacuum arrangement and vacuum chamber
DE102019124484A1 Valve assembly, vacuum assembly and method
DE102019124489B3 Vacuum arrangements, methods and use of an electrode in a vacuum
DE102019123410A1 Method and control device
DE102019119384A1 Processing arrangement, sputtering device, method
DE102019118941A1 Coating arrangement and procedure
DE102019118936A1 Coating arrangement and procedure
DE102019118934A1 Particle Separation Device, Coating Arrangement and Process
DE102019115364A1 Optical low-emission multilayer system
DE102019113092A1 Sputter cathode magnet system and vacuum arrangement
DE102019112585A1 Magnetron End Block Housing, Magnetron End Block and Process
DE102019109096A1 End block arrangement and processing arrangement
DE102019107719A1 Temperature control roller, transport arrangement and vacuum arrangement
DE102019107542A1 Method, magnetron target, magnetron arrangement and vacuum arrangement
DE102019104988A1 Supply device, method and processing arrangement
DE102019103188A1 Method, sputter target and processing arrangement
DE102019101776A1 Coating arrangement and method