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AMMONO SP Z OO

Overview
  • Total Patents
    16
About

AMMONO SP Z OO has a total of 16 patent applications. Its first patent ever was published in 2001. It filed its patents most often in Poland. Its main competitors in its focus markets surface technology and coating, optics and micro-structure and nano-technology are AHHC OPTOELECTRONIC TECH CO LTD, WUXI JIDADE LASER TECH CO LTD and OPOWER HANS DR.

Patent filings in countries

World map showing AMMONO SP Z OOs patent filings in countries
# Country Total Patents
#1 Poland 16

Patent filings per year

Chart showing AMMONO SP Z OOs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Kanbara Yasuo 16
#2 Garczynski Jerzy 16
#3 Doradzinski Roman 16
#4 Dwilinski Robert 16
#5 Sierzputowski Leszek P 11
#6 Sierzputowski Leszek 5
#7 Kucharski Robert 2

Latest patents

Publication Filing date Title
PL372746A1 Hemt type transistor built of layers of nitrides of group xiii chemical elements and method for its manufacture
PL371405A1 Method for manufacture of volumetric monocrystals by their growth on crystal nucleus
PL368781A1 Gallium containing nitride monocrystal and its application
PL368483A1 Monocrystals of nitride containing gallium and its application
PL357708A1 Method of fabrication of epitaxial layer standardized substrate (template type substrates) from voluminal mono-crystalline aluminium nitride and nitride containing gallium for epitaxy of layers with high aluminium content as well as devices requiring efficient heat abstraction
PL357699A1 Method of removing impurities from voluminal mono-crystalline nitride containing gallium
PL357703A1 Method of reducing impurity level in voluminal mono-crystalline nitride containing gallium
PL357698A1 Method of obtaining substrate from voluminal mono-crystalline nitride containing gallium
PL357702A1 Method of obtaining voluminal mono-crystalline nitride containing gallium
PL357704A1 Method of obtaining voluminal mono-crystalline nitride containing gallium
PL357705A1 Method of controlling crystal growth rate in a process of obtaining voluminal mono-crystalline nitride containing gallium
PL357701A1 Of obtaining voluminal mono-crystalline nitride containing gallium
PL354739A1 Nitride semiconductor laser
PL350398A1 Luminophore and method of obtaining same
PL350375A1 Epitaxial layer substrate