ZETA INSTR INC has a total of 24 patent applications. It decreased the IP activity by 100.0%. Its first patent ever was published in 2007. It filed its patents most often in United States, China and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets optics, computer technology and measurement are GE HEALTHCARE NIAGARA INC, ACUSOLUTIONS INC and PRICE JEFFREY H.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 16 | |
#2 | China | 6 | |
#3 | WIPO (World Intellectual Property Organization) | 2 |
# | Industry | |
---|---|---|
#1 | Optics | |
#2 | Computer technology | |
#3 | Measurement | |
#4 | Audio-visual technology | |
#5 | Semiconductors |
# | Technology | |
---|---|---|
#1 | Optical systems | |
#2 | Analysing materials | |
#3 | Image data processing | |
#4 | Television | |
#5 | Data recognition and presentation | |
#6 | Measuring length, angles and areas | |
#7 | Semiconductor devices |
# | Name | Total Patents |
---|---|---|
#1 | Soetarman Ronny | 19 |
#2 | Xu James Jianguo | 18 |
#3 | Kudinar Rusmin | 16 |
#4 | Lee Ken Kinsun | 15 |
#5 | Hou Zhen | 12 |
#6 | Nguyen Hung Phi | 10 |
#7 | Meeks Steven W | 6 |
#8 | Stainton James Nelson | 5 |
#9 | Nguyen Hung P | 4 |
#10 | Soetaman Ronny | 2 |
Publication | Filing date | Title |
---|---|---|
US2018045947A1 | Optical measurement of bump hieght | |
US2018045946A1 | Optical measurement of step size and plated metal thickness | |
US2018047148A1 | Optical measurement of opening dimensions in a wafer | |
US2018045937A1 | Automated 3-d measurement | |
US2018005364A1 | Dual mode inspector | |
US2017336331A1 | Multi-surface specular reflection inspector | |
US2017336330A1 | Method of detecting defect location using multi-surface specular reflection | |
US2015226953A1 | Multi-surface optical 3D microscope | |
US2016033421A1 | Method and apparatus to optically detect defects in transparent solids | |
US8830457B1 | Multi-surface optical inspector | |
WO2012094175A2 | 3d microscope including insertable components to provide multiple imaging and measurement capabilities | |
WO2012012265A2 | 3d microscope and methods of measuring patterned substrates | |
US2008291532A1 | 3-d optical microscope |