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YMT CO LTD

Overview
  • Total Patents
    56
  • GoodIP Patent Rank
    37,068
  • Filing trend
    ⇧ 166.0%
About

YMT CO LTD has a total of 56 patent applications. It increased the IP activity by 166.0%. Its first patent ever was published in 2006. It filed its patents most often in Republic of Korea, United States and China. Its main competitors in its focus markets surface technology and coating, audio-visual technology and basic materials chemistry are DONGGUAN STANDARD ELECTRONIC MAT CO LTD, MACDERMID INC and ALFACHIMICI SPA.

Patent filings per year

Chart showing YMT CO LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Chun Sung Wook 45
#2 Kim Ik Beom 18
#3 Lee Dae Hoon 13
#4 Kang Youn Bong 13
#5 Kang Byoung Geol 12
#6 Park Myong Whan 9
#7 Chung Bo Mook 9
#8 Chun Sang Wook 8
#9 Kim Jung Il 7
#10 Park Hyeong Gyu 7

Latest patents

Publication Filing date Title
KR102127757B1 Multi-layer structure for manufacturing circuit board and manufacturing method of circuit board
KR102124328B1 Micro-roughening composition for increasing adhesion of copper metal surface
KR102137068B1 Carrier foil with metal foil, manufacturing method of the same, and laminate comprising the same
KR102215846B1 Through-hole filling method for circuit board and circuit board using the same
KR102124327B1 EMI shielding material for circuit board and manufacturing method of PCB using the same
KR102054676B1 EMI shielding material for circuit board and manufacturing method of PCB using the same
KR102054673B1 EMI shielding material for PCB and manufacturing method of PCB using the same
KR20200055963A Plating laminate and printed circuit board
KR20200025020A Display device with metal mesh and method for manufacturing the same
KR101906122B1 Au BUMPED SURFACE CLEANING COMPOSITION AND CLEANING METHOD
KR20190143619A Material for circuit board and method for preparing the printed circuit board
KR101826062B1 Electroless tin high speed plating solution
KR101809985B1 Manufacturing method of porous copper film and porous copper film using the same
KR20180015052A Copper etching composition and method for fabricating copper interconnection using the same
KR20170092444A Method of forming electrode pattern using transcription
KR101776055B1 Etching composition for touch panel and etching method of touch panel
KR20170093058A Methode of forming electrode pattern using transcription
KR101796112B1 Cleaning composition for soldering flux residues
KR101699798B1 Copper etching composition and method for fabricating copper interconnection using the same
KR101699790B1 Composition for blackening metal thin film