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Method for measuring the thickness of a discoidal workpiece
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Device for e.g. lapping of semiconductor wafers, has upper disk movable between and loading operating positions and pressable in operating position against lower disk, where upper disk does not experience tilting in course of movement
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Method for processing flat workpieces
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Method for removing material from flat workpieces
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Device for double-sided grinding of flat workpieces
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Method for machining workpieces in a double side processing machine and double side processing machine
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Method for operating a double side grinding machine and double side grinding machine
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Method for regulating working gap of double side processing machine, involves deforming working disk of consecutively delivered working disks by adjustment device for changing form of working gap
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Method for measuring the thickness of disc-shaped workpieces machined in a processing machine
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Loading and unloading device for silicon wafer, has contact surface sloped relative to horizontal plane such that wafer with outer edges and/or transition surface between edges and plane surfaces of wafer only lies on contact surface
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Rotor disc, method for coating a rotor disc and method for the simultaneous double-sided material removing machining of semiconductor wafers
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Device for chemico-mechanical polishing of workpiece surface, especially semiconductor wafer surface useful in semiconductor technology is cost effective to produce, highly flexible in use and gives high thruput
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Double side processing machine for machining a workpiece
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Rotor disk for material-erosive processing of tool in e.g. double-sided processing machine, has insert ring engaged into recess and comprises another recess for receiving tool to be processed
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Processing machine with means for detecting processing parameters