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WOLTERS PETER GMBH

Overview
  • Total Patents
    59
About

WOLTERS PETER GMBH has a total of 59 patent applications. Its first patent ever was published in 2000. It filed its patents most often in Germany, EPO (European Patent Office) and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets machine tools, semiconductors and measurement are STRASBAUGH, SHANGHAI LEADING SEMICONDUCTOR TECH DEVELOPMENT CO LTD and DELAPENA HONING EQUIPMENT LTD.

Patent filings per year

Chart showing WOLTERS PETER GMBHs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Grotkopp Ingo 15
#2 Kanzow Joern 12
#3 Runkel Frank 8
#4 Boller Hans-Peter 8
#5 Meyer Joerg 6
#6 Gurgel Eckehard 6
#7 Jessen Sebastian 6
#8 Fries Adrian 6
#9 Fischer Harald 5
#10 Reichmann Marc 4

Latest patents

Publication Filing date Title
WO2012119616A1 Method and device for the single-sided processing of flat workpieces
DE102010019203A1 Double side grinding
DE102010005032A1 Device and method for determining the position of a working surface of a working disk
DE102009052070A1 Apparatus and method for double side machining of flat workpieces
KR20110063831A Method for measuring the thickness of a discoidal workpiece
DE102009038942A1 Apparatus for double-sided machining of flat workpieces and method for simultaneous double-sided material removing machining of multiple semiconductor wafers
DE102009036833A1 Device for e.g. lapping of semiconductor wafers, has upper disk movable between and loading operating positions and pressable in operating position against lower disk, where upper disk does not experience tilting in course of movement
DE102009024125A1 Method for processing flat workpieces
DE102009015878A1 Method for removing material from flat workpieces
DE102008063228A1 Device for double-sided grinding of flat workpieces
DE102008063227A1 Method for machining workpieces in a double side processing machine and double side processing machine
DE102008058638A1 Method for operating a double side grinding machine and double side grinding machine
DE102008056276A1 Method for regulating working gap of double side processing machine, involves deforming working disk of consecutively delivered working disks by adjustment device for changing form of working gap
DE102008049972A1 Method for measuring the thickness of disc-shaped workpieces machined in a processing machine
DE102007052981A1 Loading and unloading device for silicon wafer, has contact surface sloped relative to horizontal plane such that wafer with outer edges and/or transition surface between edges and plane surfaces of wafer only lies on contact surface
DE102007049811A1 Rotor disc, method for coating a rotor disc and method for the simultaneous double-sided material removing machining of semiconductor wafers
DE102007037964A1 Device for chemico-mechanical polishing of workpiece surface, especially semiconductor wafer surface useful in semiconductor technology is cost effective to produce, highly flexible in use and gives high thruput
DE102007031299A1 Double side processing machine for machining a workpiece
DE102007029907A1 Rotor disk for material-erosive processing of tool in e.g. double-sided processing machine, has insert ring engaged into recess and comprises another recess for receiving tool to be processed
DE102007011880A1 Processing machine with means for detecting processing parameters