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WIESNER IVO

Overview
  • Total Patents
    148
About

WIESNER IVO has a total of 148 patent applications. Its first patent ever was published in 1965. It filed its patents most often in Czechoslovakia, Switzerland and Czechia. Its main competitors in its focus markets macromolecular chemistry and polymers are PROLUX PAINT MFG PTY, POLLAK FRITZ DR and INST DE CHIMIE MACROMOLECULARA PETRU PONI.

Patent filings in countries

World map showing WIESNER IVOs patent filings in countries
# Country Total Patents
#1 Czechoslovakia 146
#2 Switzerland 1
#3 Czechia 1

Patent filings per year

Chart showing WIESNER IVOs patent filings per year from 1900 to 2020

Focus industries

Focus technologies

Top inventors

# Name Total Patents
#1 Wiesner Ivo 116
#2 Novak Jiri 31
#3 Wiesner Ivo Ing 31
#4 Wiesnerova Ludmila 26
#5 Bruthans Vaclav 16
#6 Wiesnerova Ludmila Ing 14
#7 Jarolimek Premysl 14
#8 Mueller Karel 11
#9 Elbel Jiri 10
#10 Zalsky Vitezslav 10

Latest patents

Publication Filing date Title
CS587890A3 Epoxyacrylate composition
CS174490A3 Reactive composition
CS174590A3 Reactive composition
CS348589A3 Hardenable pouring floor covering
CS348489A3 Composition for electrically-conducting plastic mortars and cements
CZ116389A3 Composition, particularly for penetrations, impregnations and injections of porous materials
CS832088A1 Thermooxidatively stabilized diane
CS831888A1 Thermooxidatively stabilized diane
CS831988A1 Thermooxidatively stabilized diane
CS827088A1 Curing agent for epoxy compositions
CS827188A1 Setting agent with increased reactivity
CS827288A1 Composition especially for materials with increased chemical resistance
CS529788A1 Composition especially for high-strong composites and solventless penetrants
CS529688A1 Method of low-molecular epoxy resins production
CS427388A1 Epoxy composition especially for building work's spil till grindable electrostatically conductive coatings
CS427588A1 Thixotropic epoxy composition
CS427488A1 Epoxy composition especially for cast floors
CS427188A1 Method of high-molecular epoxy resins preparation with content of free epichlorohydrin under 20 ppm
CS707087A1 Epoxy resin on the base of diane with modified time of workability
CS533487A1 Aminoamide resin