Crystalline-liquid 2,5-disubstituted 1,3,4-thiadiazoles with extended smectic C-phases
DD295279A5
Plasma-chemical process for the deposition of a protective layer on metal contacts of a [indiii] b [indv] compounds and mix connector semiconductor surfaces
DD294818A5
Arrangement for the welding of miniature glass hoses for semiconductor components with optimal heat removal
DD294806A5
Coating method for producing a rolling-oriented surface structure on substrates
DD299340A5
Device for applying a liquid crystal molecular large-layer orientation layer with surface microstructure
DD294517A5
Method and device for the fluid phase pitaxis of hg [ind1-x] cd [indx] te-layers
DD294351A5
Arrangement for producing hysteresis-free vibrations of optical mirrors in any form, especially vibrations with freely selectable amplitude
DD293690A5
Self-adjusted coupling of vertical registers to horizontal two-phase ccd register
DD293681A5
Arrangement for automatic measurement of the distance between the shield interior of a color picture tube and the surface of a shadow mask associated with the visor part
DD300062A7
A method of making a roughened A3-B5 mixed crystal semiconductor surface
DD293575A5
Method for producing metallized fibers of light waveguides
DD293680A5
Measuring arrangement for determining the distance of a color mask mask from the shirt's glass inside
DD300061A7
A method of fabricating a planar roughened A-3-B5 mixed crystal semiconductor surface
DD300839A7
Process for producing a radiation efficiency-enhancing layer on semiconductor light bodies
DD292341A5
Method for producing miniaturized semiconductor indicators
DE4004281A1
MESOGENIC AND PROMESOUS NONTRACEMIC CHIRAL COMPOUNDS
DD292112A5
Method for process control and process characterization for exhaust treatment of plasma cvd and pecvd processes
DD300063A7
Method of handling any molded connecting semiconductor discs
DD291876A5
Diffusion process for the manufacture of p + pn dotation profiles in a deep iii b deep v semiconductor materials and device for processing
DD291852A5
Method of applying distance elements to substrates in optoelectronic components
