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UNIV CLARKSON

Overview
  • Total Patents
    47
  • GoodIP Patent Rank
    86,389
  • Filing trend
    ⇧ 100.0%
About

UNIV CLARKSON has a total of 47 patent applications. It increased the IP activity by 100.0%. Its first patent ever was published in 1987. It filed its patents most often in United States, WIPO (World Intellectual Property Organization) and Australia. Its main competitors in its focus markets materials and metallurgy, basic materials chemistry and chemical engineering are ASTAV ANORGANICKU CHEMIE AV CR, UNIV HUAIBEI NORMAL and LEE JONG HEOP.

Patent filings per year

Chart showing UNIV CLARKSONs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Babu Suryadevara V 8
#2 Matijevic Egon 7
#3 Kuxhaus Laurel 5
#4 Goia Dan V 5
#5 Goia Corina 5
#6 Andreescu Daniel 4
#7 Njagi John I 4
#8 Mededovic Selma 4
#9 Schuckers Stephanie 4
#10 Stratton Gunnar 4

Latest patents

Publication Filing date Title
US2020106111A1 Material Compositions And Methods For Porous Graphite-Polymer Composite Bipolar Plates
US2019315158A1 Wheel Spikes
WO2018226834A1 Adjustable length orthopedic device
US2018011816A1 Methods and systems for calculating uncertainty
US2017140881A1 Activated carbons from dairy products
EP3496848A1 Enhanced contact electrical discharge plasma reactor for liquid and gas processing
WO2016112081A1 Silver coated copper flakes and methods of their manufacture
US2014294262A1 Fingerprint pore analysis for liveness detection
WO2014031633A1 Portable nanoparticle based assay for rapid detection of food antioxidants (nanocerac)
US2013331662A1 Portable monitoring device for breath detection
US2013325008A1 Adjustable length orthopedic device
WO2013159096A1 Methods for water-borne thiol-ene polymerization
EP2718711A2 Reagentless ceria-based colorimetric sensor
WO2012103091A2 Abrasive free silicon chemical mechanical planarization
US2010098768A1 Method of neuroprotection from oxidant injury using metal oxide nanoparticles
US7875248B1 Thin film tube reactor with rotating reservoir
US7761255B1 Method of and apparatus for studying fast dynamical mechanical response of soft materials
US2008116171A1 Method For The Preferential Polishing Of Silicon Nitride Versus Silicon Oxide
US2008116172A1 Method for one-to-one polishing of silicon nitride and silicon oxide
US2008119051A1 Method for selective CMP of polysilicon