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UENO CHEM IND

Overview
  • Total Patents
    36
  • GoodIP Patent Rank
    232,041
About

UENO CHEM IND has a total of 36 patent applications. Its first patent ever was published in 1974. It filed its patents most often in Japan. Its main competitors in its focus markets optics, macromolecular chemistry and polymers and chemical engineering are DYNA FLEX CORP, KOYO KAGAKU KOGYO KK and NIPPON DENSHI SEIKI KK.

Patent filings in countries

World map showing UENO CHEM INDs patent filings in countries
# Country Total Patents
#1 Japan 36

Patent filings per year

Chart showing UENO CHEM INDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Tokura Masao 15
#2 Matsushita Hiroshi 11
#3 Taniguchi Shoji 7
#4 Kiritani Yasushi 7
#5 Wakasaki Nobuhiko 7
#6 Hirai Kazuhisa 5
#7 Kitatani Masatoshi 5
#8 Andou Hirotaka 4
#9 Taniguchi Shiyouji 3
#10 Matsuura Kosuke 2

Latest patents

Publication Filing date Title
JP2017218489A Cleaning and restoring agent for ultraviolet-curable ink blanket
JP2013216727A Detergent for ink roller and blanket, and cleaning method using this
JP2008156612A Cleaning liquid for ultraviolet light-curable ink
JP2006160894A Cleansing liquid for ultraviolet light-curable ink and cleansing method using the same
JP2000158631A Print inspection machine
JPH11295906A Device for aligning photoengraving original plate film
JPH11109655A Register mark alignment device for original film for photoengraving
JPH103167A Water-soluble photosensitive composition
JPH0979984A Printing stamper inspection machine
JPH08150378A Film photograph cleaner
JPH07261365A Method for trimming photomechanical process and production therefor
JPH0792653A Retouching liquid and retouching tool for photographic plate making
JPH0519436A Sheet for cleaning developing machine
JPH04360795A Paper cutter
JPH0389348A Contour extracting method in halftone image and its manufacturing device
JPH01217009A Maleic acid derivative-isobutylene copolymer and production thereof
JPH01219736A Photosensitive resin composition
JPH01128172A Contour extracting device
JPS6479748A Eraser for photomechanical process
JPS61278847A Positive type photosensitive composition