|
KR20200144388A
|
|
dust collector filter system
|
|
KR20180066571A
|
|
Plasma scrubber having baffle plate
|
|
KR20180066576A
|
|
Arc plasma waste gas treatment apparatus
|
|
KR20180066573A
|
|
Plasma generator having multistage swirl structure and waste gas treatment apparatus having the plasma generator
|
|
KR20180066575A
|
|
Anode structure for plasma torch using arc discharge and plasma torch with the same
|
|
KR20180066572A
|
|
Exhaust module having anti-absorption of power
|
|
KR20180066574A
|
|
Scrubber applicable to quenching of plasma treatment gas and waste gas treatment apparatus having the scrubber
|
|
KR20170011462A
|
|
Method for operating plasma gas scrubber
|
|
KR20160043821A
|
|
Variable capacity magnetron
|
|
KR20160043820A
|
|
Plasma processing apparatus
|
|
KR101609474B1
|
|
System and method for treating gas from chemical vapor deposition apparatus
|
|
KR101427720B1
|
|
Plasma waveguide using step part and block part
|
|
KR20130052514A
|
|
Mobile communication terminaal and method for changing call mode
|
|
KR20140010686A
|
|
Equipment for controlling by-product in exhaustion line and pump used for process chamber in semiconductor field and control method for the same
|
|
KR20130090699A
|
|
Apparatus and method for treating gas powder for semicouductor process system
|
|
KR20130090698A
|
|
Apparatus and method for treating gas powder for semicouductor process system
|
|
KR20130049481A
|
|
Plasma reactor and and gas scrubber using the same
|
|
KR20130048577A
|
|
Plasma reactor and and gas scrubber using the same
|
|
KR20130048576A
|
|
Plasma reactor and and gas scrubber using the same
|
|
TW201306670A
|
|
Atmospheric plasma equipment and waveguide for the same
|
