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TESSERA TECH IRELAND LTD

Overview
  • Total Patents
    67
About

TESSERA TECH IRELAND LTD has a total of 67 patent applications. Its first patent ever was published in 2004. It filed its patents most often in United States, EPO (European Patent Office) and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets computer technology, audio-visual technology and optics are HIKIDA SATOSHI, ISHIDA YOSHIHIRO and DIGITALOPTICS CORP EUROPE LTD.

Patent filings per year

Chart showing TESSERA TECH IRELAND LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Corcoran Peter 46
#2 Steinberg Eran 38
#3 Bigioi Petronel 34
#4 Pososin Alexei 14
#5 Prilutsky Yury 14
#6 Nanu Florin 14
#7 Ciuc Mihai 13
#8 Drimbarean Alexandru 13
#9 Capata Adrian 10
#10 Zamfir Adrian 9

Latest patents

Publication Filing date Title
WO2011082366A1 Auto white balance algorithm using rgb product measure
US2011216157A1 Object Detection and Rendering for Wide Field of View (WFOV) Image Acquisition Systems
US2011102643A1 Partial Face Detector Red-Eye Filter Method and Apparatus
WO2011069698A1 Panorama imaging
WO2011000841A1 Methods and apparatuses for half-face detection
US2011102553A1 Enhanced real-time face models from stereo imaging
WO2010145910A1 Low-light video frame enhancement
WO2010133661A1 Identifying facial expressions in acquired digital images
US2009303342A1 Face tracking for controlling imaging parameters
KR20110031433A Techniques for reducing noise while preserving contrast in an image
KR20100116178A Detecting facial expressions in digital images
US2008232711A1 Two stage detection for photographic eye artifacts
US2008219518A1 Red eye false positive filtering using face location and orientation
EP2108231A2 Imaging system with improved image quality and associated methods
EP2033142A2 Advances in extending the aam techniques from grayscale to color images
US2008292193A1 Image processing method and apparatus
US2007190691A1 Wafer level chip packaging
US2008099900A1 Wafer-level fabrication of lidded chips with electrodeposited dielectric coating
US2008240555A1 Two stage detection for photographic eye artifacts