TAMAI TADAMOTO has a total of 20 patent applications. Its first patent ever was published in 1998. It filed its patents most often in Japan, United Kingdom and Taiwan. Its main competitors in its focus markets semiconductors, environmental technology and machines are ION PHYSICS CORP, RAYVIO CORP and ZHONG XIN.
# | Country | Total Patents | |
---|---|---|---|
#1 | Japan | 14 | |
#2 | United Kingdom | 2 | |
#3 | Taiwan | 2 | |
#4 | Republic of Korea | 1 | |
#5 | United States | 1 |
# | Industry | |
---|---|---|
#1 | Semiconductors | |
#2 | Environmental technology | |
#3 | Machines | |
#4 | Electrical machinery and energy |
# | Technology | |
---|---|---|
#1 | Semiconductor devices | |
#2 | Unspecified technologies | |
#3 | Water treatment | |
#4 | Electric discharge tubes |
# | Name | Total Patents |
---|---|---|
#1 | Tamai Tadamoto | 20 |
Publication | Filing date | Title |
---|---|---|
JP2009191924A | Gate valve | |
JP2009146865A | Object holding arm | |
JP2009136952A | Extensible arm | |
JP2008188718A | Object holding arm | |
JP2008188719A | Expansion arm | |
JP2005039285A | Vacuum processor | |
JP2006019639A | Vacuum processing apparatus | |
JP2004289036A | Vacuum processing apparatus | |
JP2003124300A | Clamp device and expansion arm | |
JP2003033421A | Massage implement | |
GB9911187D0 | Ion implanter | |
JP2000251828A | Substrate holding device | |
JPH11330196A | Wafer carrying equipment and carrying method therefor | |
JPH11329333A | Ion implanter | |
JPH11283552A | Device and method for ion implantation, ion-beam source and variable slit mechanism |