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SYSTEMSEIKO CO LTD

Overview
  • Total Patents
    41
  • GoodIP Patent Rank
    240,540
About

SYSTEMSEIKO CO LTD has a total of 41 patent applications. Its first patent ever was published in 1997. It filed its patents most often in Japan. Its main competitors in its focus markets measurement, machine tools and audio-visual technology are KYOEI DENKO KK, KYOEI DENKO CO LTD and HOYA GLASS DISK THAILAND LTD.

Patent filings in countries

World map showing SYSTEMSEIKO CO LTDs patent filings in countries
# Country Total Patents
#1 Japan 41

Patent filings per year

Chart showing SYSTEMSEIKO CO LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Okuyama Shinichi 11
#2 Shimamoto Atsushi 7
#3 Otsuka Fumio 7
#4 Iwata Tetsuya 5
#5 Iihama Takao 4
#6 Nagahashi Isao 3
#7 Nagao Katsunori 3
#8 Takahashi Yoshimasa 3
#9 Murakami Takashi 3
#10 Takada Atsushi 2

Latest patents

Publication Filing date Title
JP2017107082A Optical scanning device, optical scanning method and surface inspection device
JP2003145398A Disc workpiece grinding method and device
JP2002137155A Method and device for grinding outer periphery of work
JP2001162233A Washing method, washing and drying method and work feed apparatus
JP2001157960A Polishing method, polishing device, and bearing device
JP2001150336A Manufacturing method and polishing method for flat plate-shaped substrate
JP2001150309A Grinding method and grinding device
JP2001129750A Method and device for grinding work edge
JP2001096245A Cleaning method and cleaning equipment
JP2001088022A Polishing method and device
JP2001038610A Grinding method
JP2001025964A Grinding method and grinding device
JP2001023159A Method and apparatus for cleaning and drying
JP2000334728A Production of magnetic disk substrate
JP2000108022A Surface treating method and device
JP2000329537A Method and apparatus for inspection of surface
JP2000317820A Polishing method and polishing device
JP2000317788A Polishing method for outer circumference of work and polishing device
JP2000271843A Polishing method and polishing device
JP2000263402A Polishing method and polishing device