SOLAR APPLIED MATERIALS TECHNO has a total of 11 patent applications. Its first patent ever was published in 2002. It filed its patents most often in Japan, United States and China. Its main competitors in its focus markets materials and metallurgy, surface technology and coating and environmental technology are YOSHIDA YASUTAKA, LUOYANG KEWEI MOLYBDENUM & TUNGSTEN CO LTD and NINGBO GUANGBO NEW NANOMATERIALS STOCK CO LTD.
# | Country | Total Patents | |
---|---|---|---|
#1 | Japan | 4 | |
#2 | United States | 4 | |
#3 | China | 2 | |
#4 | Taiwan | 1 |
# | Industry | |
---|---|---|
#1 | Materials and metallurgy | |
#2 | Surface technology and coating | |
#3 | Environmental technology | |
#4 | Electrical machinery and energy | |
#5 | Semiconductors | |
#6 | Machine tools |
# | Name | Total Patents |
---|---|---|
#1 | Li Wei-Cheng | 3 |
#2 | Wu Shin-Shian | 2 |
#3 | Liao Hao-Chia | 2 |
#4 | Tu Cheng-Hsin | 2 |
#5 | Jau Chin-Shiau | 2 |
#6 | Wang Tzu-Wen | 2 |
#7 | Chen Jin-Duo | 2 |
#8 | Chan Chih-Yao | 2 |
#9 | Huang Wei-Chin | 2 |
#10 | Chen Deng-Ke | 2 |
Publication | Filing date | Title |
---|---|---|
US2010226839A1 | Method For Recovery of Gallium | |
US2010288631A1 | Ceramic sputtering target assembly and a method for producing the same | |
US2010116341A1 | Copper-gallium allay sputtering target, method for fabricating the same and related applications | |
JP2010116580A | Sputtering target of copper-gallium alloy, method for manufacturing the same, and related application | |
CN1844446A | Ceramic sputtering targets of tantalum-base compound and its use method and preparation method | |
JP2004296286A | Recovery method of inferior goods of plasma display panel | |
CN1523630A | Method for handling non-conforming article of plasma display panel | |
JP2004076068A | Reflective coating material for flat display | |
TW550562B | Alloy material for reflection film of reflection type flat panel display and sputtering target material |