SIGMA TECH INC has a total of 12 patent applications. It decreased the IP activity by 100.0%. Its first patent ever was published in 2000. It filed its patents most often in United States, EPO (European Patent Office) and China. Its main competitors in its focus markets chemical engineering, measurement and surface technology and coating are KONPON KK, LIANG MEILIAN and TAICANG HONGSHAN ENV PROT TECH CO LTD.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 4 | |
#2 | EPO (European Patent Office) | 3 | |
#3 | China | 2 | |
#4 | WIPO (World Intellectual Property Organization) | 2 | |
#5 | Australia | 1 |
# | Industry | |
---|---|---|
#1 | Chemical engineering | |
#2 | Measurement | |
#3 | Surface technology and coating | |
#4 | Environmental technology | |
#5 | Pharmaceuticals | |
#6 | Machines | |
#7 | Consumer goods |
# | Technology | |
---|---|---|
#1 | Mixing | |
#2 | Water treatment | |
#3 | Measuring length, angles and areas | |
#4 | Spraying devices | |
#5 | Medical preparations | |
#6 | Layered products | |
#7 | Cleaning | |
#8 | Processes for applying fluent materials | |
#9 | Chemical or physical processes | |
#10 | Laundering textiles |
# | Name | Total Patents |
---|---|---|
#1 | Tachibana Yoshiaki | 8 |
#2 | Sasajima Souzou | 4 |
#3 | Tachibana Kousuke | 4 |
#4 | Honma Kyoko | 4 |
#5 | Fauque Jacques A | 3 |
#6 | Tamahashi Kunihiro | 2 |
#7 | Tachibana Kosuke | 2 |
#8 | Yamanouchi Dai | 2 |
#9 | Harada Kaoru | 2 |
#10 | Matumoto Yuuki | 1 |
Publication | Filing date | Title |
---|---|---|
WO2019026195A1 | Microbubble generation device, microbubble generation method, and shower apparatus and oil-water separation apparatus comprising said microbubble generation device | |
EP3456815A1 | Aqueous solution capable of being administered to living body, and method for producing same | |
US2018161737A1 | Cleaning method and cleaning device using micro/nano-bubbles | |
US2015273408A1 | Method, a bubble generating nozzle, and an apparatus for generating micro-nano bubbles | |
US6220080B1 | Extended range and ultra precision non contact dimensional gauge for ultra thin wafers and work pieces |