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SHOWA HIGHPOLYMER

Overview
  • Total Patents
    1,775
About

SHOWA HIGHPOLYMER has a total of 1,775 patent applications. Its first patent ever was published in 1970. It filed its patents most often in Japan, United States and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets macromolecular chemistry and polymers, machines and packaging and shipping are ARCO CHEM CO, HUNTSMAN ADV MAT AMERICAS INC and MATERIAUX ORGANIQUES POUR TECH.

Patent filings per year

Chart showing SHOWA HIGHPOLYMERs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Takiyama Eiichiro 474
#2 Morita Katsuhisa 136
#3 Otani Kazuo 106
#4 Hosogane Tadayuki 106
#5 Hatano Yoshitaka 100
#6 Takiyama Eiichirou 97
#7 Ogura Tateshi 87
#8 Arai Michiaki 80
#9 Matsui Fumio 74
#10 Kasai Juichi 73

Latest patents

Publication Filing date Title
JP2010077448A Resin composition for molding loose foamed body, and loose foamed body
JP2010180400A Novolac resin and thermosetting resin composition
JP2010012794A Photocuring method and light irradiation apparatus
JP2011057787A Method for producing organic-inorganic hybrid composition, the composition, and semiconductor device
JP2010280613A Method for producing phosphorus-based flame retardant
JP2010260923A Foaming resin composition and foam
JP2010254859A Foamed resin sheet, foamed resin sheet molding, and process for producing the same
JP2010159389A Expandable resin composition and foam
JP2009249638A Emulsion fuel
JP2010241753A Phosphorus-containing polyparaxylene aryl ether compound, method for producing the same, flame-retardant thermosetting resin composition, cured product and laminated sheet
JP2010241941A Quick-drying aqueous coating material composition
JP2010235830A Resin composition and processed paper or fiber product treated therewith
JP2010204151A Photosensitive resin composition
JP2010195950A Aqueous composition of graft modified starch, and curable composition using the same
JP2010189464A Photosensitive resin composition, and method for manufacturing photosensitive resin for use in the same
JP2010180306A Active energy ray-curable hard-coating composition
JP2010159362A Novolac resin and process for producing the same
JP2010159323A Foamable resin composition and foamed body
JP2010143999A Curing agent for epoxy resin and epoxy resin composition containing the same
JP2010143998A Curing agent for epoxy resin and epoxy resin composition containing the same