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SEMICONDUCTOR MANUFACTUNING INTERNAT SHANGHAI CO LTD

Overview
  • Total Patents
    17
About

SEMICONDUCTOR MANUFACTUNING INTERNAT SHANGHAI CO LTD has a total of 17 patent applications. Its first patent ever was published in 2008. It filed its patents most often in China. Its main competitors in its focus markets semiconductors and environmental technology are KYOWA KASEI KK, XIAOYE JIANG and G N PROIZV PREDPR ISTOK.

Patent filings in countries

World map showing SEMICONDUCTOR MANUFACTUNING INTERNAT SHANGHAI CO LTDs patent filings in countries
# Country Total Patents
#1 China 17

Patent filings per year

Chart showing SEMICONDUCTOR MANUFACTUNING INTERNAT SHANGHAI CO LTDs patent filings per year from 1900 to 2020

Focus industries

Top inventors

# Name Total Patents
#1 Meng Zhao 3
#2 Wu Jingang 2
#3 Zhu Hong 1
#4 Dong Ouyang 1
#5 Dawei Gao 1
#6 Minghua Ji 1
#7 Wanchun Ding 1
#8 Wang Pingting 1
#9 Shanshan Du 1
#10 Jian Yang 1

Latest patents

Publication Filing date Title
CN101740367A Method for manufacturing stepped gate oxide and semiconductor device
CN101740393A Semiconductor device and manufacture method thereof
CN101740379A Method for eliminating surface defect of semiconductor device and semiconductor device
CN101738419A Method for detecting variable resistance material
CN101740474A Method for manufacturing semiconductor device and dual-damascene structure
CN101740513A MOS (Metal Oxide Semiconductor) transistor and fabricating method thereof
CN101740514A MOS (Metal Oxide Semiconductor) transistor and fabricating method thereof
CN101740473A Interlayer dielectric layer, interconnection structure and manufacturing method thereof
CN101740469A Method for manufacturing aluminum wiring
CN101740472A Method for manufacturing semiconductor device with copper wiring and semiconductor device
CN101740422A Method for fabricating bump
CN101740329A Plasma processing method
CN101738992A Method and device for testing product on line
CN101740328A Etching method
CN101736310A Gas delivery system applied to tungsten chemical vapor deposition technology
CN101740327A Method for manufacturing chip capable of reducing stress
CN101740388A Method for manufacturing metal-semiconductor field effect transistor