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SAN APRO KK

Overview
  • Total Patents
    121
  • GoodIP Patent Rank
    38,143
  • Filing trend
    ⇩ 63.0%
About

SAN APRO KK has a total of 121 patent applications. It decreased the IP activity by 63.0%. Its first patent ever was published in 1985. It filed its patents most often in Japan, United States and Canada. Its main competitors in its focus markets macromolecular chemistry and polymers, organic fine chemistry and optics are GHARDA CHEMICALS LTD, SHENZHEN DALTON ELECTRONIC MAT CO LTD and PITTSBURG STATE UNIVERSITY.

Patent filings in countries

World map showing SAN APRO KKs patent filings in countries
# Country Total Patents
#1 Japan 114
#2 United States 4
#3 Canada 1
#4 Germany 1
#5 United Kingdom 1

Patent filings per year

Chart showing SAN APRO KKs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Kimura Hideki 25
#2 Nakasugi Nobuyasu 23
#3 Shibagaki Tomoyuki 21
#4 Suzuki Kazuo 16
#5 Takashima Yusaku 16
#6 Nakatani Keiichi 15
#7 Shiraishi Atsushi 12
#8 Ikeda Takuya 11
#9 Kurosaki Masatada 11
#10 Funayama Jun 10

Latest patents

Publication Filing date Title
JP2020200393A Epoxy resin curing accelerator and epoxy resin composition
JP2020086083A Photo-acid generator and resin composition for photolithography
JP2020002115A Method for producing sulfonium salt
JP2019215388A Photoacid generator and resin composition for photolithography
JP2019197146A Photoacid generator and resin composition for photolithography
JP2019099666A Resin composition for optical solid molding
JP2019090988A Chemically amplified photoresist compositions
JP2019090933A Chemical amplification type positive type photoresist composition
JP2019085533A Curable composition and optical element using the same
JP2019085358A Heat acid generator and curable composition
JP2019086559A Resin composition for negative photoresist and cured film
JP2019073470A Photoacid generator, curable composition and resist composition
JP2019003122A Photosensitive composition
JP2018203963A Epoxy resin curing accelerator and epoxy resin composition
JP2018203916A Epoxy resin composition
JP2018112670A Photoacid generator and resin composition for photolithography
JP2018104559A Epoxy resin curing accelerator
JP2018105957A Photoacid generator and resin composition for photolithography
JP2018056273A Curable composition for optical nanoimprint
JP2018002820A Epoxy resin-curing accelerator