Learn more

OSAKA ORGANIC CHEMICAL IND LTD

Overview
  • Total Patents
    104
  • GoodIP Patent Rank
    18,929
  • Filing trend
    ⇩ 28.0%
About

OSAKA ORGANIC CHEMICAL IND LTD has a total of 104 patent applications. It decreased the IP activity by 28.0%. Its first patent ever was published in 1988. It filed its patents most often in WIPO (World Intellectual Property Organization), Taiwan and China. Its main competitors in its focus markets macromolecular chemistry and polymers, optics and organic fine chemistry are SMS, HINTZER KLAUS and ARLANXEO CANADA INC.

Patent filings per year

Chart showing OSAKA ORGANIC CHEMICAL IND LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Tsubaki Koki 23
#2 Awa Shigeki 17
#3 Tomimori Yuya 15
#4 Saruwatari Yoshiyuki 15
#5 Kouda Mitsuhiro 14
#6 Matsuyama Takanori 10
#7 Robin Rajan 9
#8 Nakano Nobuhiro 8
#9 Ito Keisuke 8
#10 Hyakumoto Megumi 8

Latest patents

Publication Filing date Title
WO2021029359A1 Conductivity improving agent
WO2021029361A1 Novel electric conductivity improving agent
WO2021029362A1 Novel firing temperature reducing agent for conductive material
WO2021029360A1 Method for manufacturing substrate coated with electroconductive material, multi-layer material, and substrate coated with electroconductive material
WO2021020499A1 Curable resin composition, elastomer and sheet
WO2020251004A1 Curable resin composition, insulating cured film provided by curing said composition and insulating cured touch panel film provided by curing said composition, and touch panel
WO2020111106A1 Piezoelectric material and composition for piezoelectric material
TW202012530A Curable resin composition, polymer, (meth)acrylic elastomer and sheet
WO2020017545A1 Curable resin composition, (meth)acrylic elastomer, and sheet
WO2019221135A1 Curable resin composition
CN111902388A Composition containing isobornyl (meth) acrylate and preparation method thereof
WO2019065686A1 Photosensitive resin composition for forming photospacer, method for forming photospacer, substrate equipped with photospacer, and colour filter
WO2019065687A1 Photosensitive resin composition for forming photospacer, method for forming photospacer, substrate equipped with photospacer, and colour filter
WO2018221314A1 Polymerization inhibitor and method for producing (meth)acrylic acid ester using said polymerization inhibitor, rectified product
WO2018199203A1 Method for producing polyfunctional acrylate
TW201841955A Photosensitive resin composition
CN111936573A Curable resin composition for forming heat-resistant and easily peelable cured resin film, and method for producing same
TW201934323A Curable resin composition for forming heat-resistant and easily-peelable cured resin film, and manufacturing method thereof capable of being coated onto a surface of a glass substrate to form a cured resin film
WO2018066594A1 (meth)acrylic monomer and method for producing same
WO2018034342A1 Curable resin composition for forming easily-peelable film, and method for producing same