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OMI TADAHIRO

Overview
  • Total Patents
    642
About

OMI TADAHIRO has a total of 642 patent applications. Its first patent ever was published in 1984. It filed its patents most often in Japan, Taiwan and United States. Its main competitors in its focus markets semiconductors, machines and surface technology and coating are OHMI TADAHIRO, TADAHIRO OHMI and ORBOTECH LT SOLAR LLC.

Patent filings in countries

World map showing OMI TADAHIROs patent filings in countries
# Country Total Patents
#1 Japan 622
#2 Taiwan 15
#3 United States 3
#4 China 2

Patent filings per year

Chart showing OMI TADAHIROs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Omi Tadahiro 627
#2 Hirayama Masaki 78
#3 Ikeda Shinichi 62
#4 Sugawa Shigetoshi 61
#5 Nitta Takehisa 51
#6 Shirai Yasuyuki 48
#7 Yamaji Michio 46
#8 Takehisa Kiwamu 41
#9 Shibata Sunao 26
#10 Doi Ryosuke 25

Latest patents

Publication Filing date Title
JP2010218571A Pressure type flow control device
JP2010135810A METHOD OF CONTROLLING pH VALUE OF SOLUTION AND OXIDATION-REDUCTION POTENTIAL, AND APPARATUS
JP2010004073A Silicon carbide product, manufacturing method thereof and silicon carbide product cleaning method
JP2009116904A Pressure type flow control device
JP2009141376A Complementary mis device
JP2008286812A Differential flow meter
JP2008270839A Plasma processing apparatus
JP2008243827A Plasma processing method
JP2008144766A Vacuum apparatus
JP2008103754A Method of using valve for vacuum evacuation system
JP2008091920A Substrate processing system
JP2007295003A Apparatus and method for oscillating excimer laser, aligner, and laser tube
JP2007210033A Long life welding electrode and its welding head
JP2007056371A Long-life welding electrode and its fixing structure, welding head, and welding method
JP2007003013A Fluid control device
JP2006295205A Plasma processing apparatus
JP2006237640A Manufacturing method for semiconductor
JP2006222448A Continuous emission excimer laser oscillation equipment
JP2006203246A Plasma processing device
JP2006203247A Plasma processing device