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WO2014111264A1
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COATING METHOD FOR PRODUCING (Al,Cr)2O3-BASED COATINGS WITH ENHANCED PROPERTIES
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DE102013018007A1
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Method for improving the Gegenkörperverschleisses in tribological contact
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DE102013019691A1
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Hard material layer for reducing heat input into the coated substrate
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DE102013018867A1
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(Al, Cr, Ta) N-coating for improved temperature resistance
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EP2868768A1
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Shutter system
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DE102013015580A1
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Gas flow device for equipment for the radiation treatment of substrates
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DE102013011071A1
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TixSi1-xN layers with CryAl1-yN adhesion layer and their preparation
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DE102013011068A1
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Target age compensation method for performing stable reactive sputtering
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DE102013011073A1
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TlxSi1-xN layers and their preparation
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DE102013011072A1
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target preparation
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DE102013011066A1
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Heat-light separation for a UV radiation source
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DE102013007926A1
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Gloss level adjustment of plastic substrates with metallic finish
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DE102013007454A1
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Versatile holding device for surface treatment of bar-shaped substrates
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DE102013007453A1
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Holder for components
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DE102013007452A1
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Mount for deep hole drill
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DE102013007305A1
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Reactive sputtering with intermetallic or ceramic target
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DE102013007146A1
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DLC coating with shrinkage layer
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DE102013006633A1
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Spark vaporization of metallic, intermetallic and ceramic target materials to produce Al-Cr-N coatings
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DE102013006598A1
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Coating system with ZrO₂ for electrosurgical devices
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DE102013002911A1
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Decorative, deep black coating
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