NOVAPURE CORP has a total of 12 patent applications. Its first patent ever was published in 1988. It filed its patents most often in United States, WIPO (World Intellectual Property Organization) and Canada. Its main competitors in its focus markets chemical engineering, materials and metallurgy and measurement are AERONEX INC, ZHEJIANG KAISN FLUOROCHEMICAL CO LTD and RECH S ET D EXPL S PETROLIFERE.
# | Country | Total Patents | |
---|---|---|---|
#1 | United States | 8 | |
#2 | WIPO (World Intellectual Property Organization) | 2 | |
#3 | Canada | 1 | |
#4 | EPO (European Patent Office) | 1 |
# | Industry | |
---|---|---|
#1 | Chemical engineering | |
#2 | Materials and metallurgy | |
#3 | Measurement | |
#4 | Surface technology and coating | |
#5 | Civil engineering | |
#6 | Machines | |
#7 | Mechanical elements |
# | Technology | |
---|---|---|
#1 | Separation | |
#2 | Analysing materials | |
#3 | Non-metallic elements | |
#4 | Chemical or physical processes | |
#5 | Compounds containing metals | |
#6 | Dredging | |
#7 | Compressed gas holders | |
#8 | Coating metallic material | |
#9 | Single-crystal-growth | |
#10 | Unspecified technologies |
# | Name | Total Patents |
---|---|---|
#1 | Tom Glenn M | 11 |
#2 | Mcmanus James V | 5 |
#3 | Brown Duncan W | 1 |
#4 | Hardwick Steven | 1 |
Publication | Filing date | Title |
---|---|---|
US5385689A | Process and composition for purifying semiconductor process gases to remove Lewis acid and oxidant impurities therefrom | |
US5320817A | Process for sorption of hazardous waste products from exhaust gas streams | |
US5260585A | Endpoint and/or back diffusion gas impurity detector, and method of using the same | |
US5094830A | Process for removal of water and silicon mu-oxides from chlorosilanes | |
US5138869A | In-line detector system for real-time determination of impurity concentration in a flowing gas stream | |
US5151395A | Bulk gas sorption and apparatus, gas containment/treatment system comprising same, and sorbent composition therefor | |
US5057242A | Composition, process, and apparatus, for removal of water and silicon mu-oxides from chlorosilanes |