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NORTH AMERICAN ROCKWELL

Overview
  • Total Patents
    3,089
About

NORTH AMERICAN ROCKWELL has a total of 3,089 patent applications. Its first patent ever was published in 1954. It filed its patents most often in United States, Germany and Canada. Its main competitors in its focus markets machines, textiles and paper and basic communication technologies are ROCKWELL INTERNATIONAL CORP, TELEDYNE INC and CLEVITE CORP.

Patent filings in countries

World map showing NORTH AMERICAN ROCKWELLs patent filings in countries

Patent filings per year

Chart showing NORTH AMERICAN ROCKWELLs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Brown Walter 20
#2 Booher Robert K 20
#3 Stamm Alex F 19
#4 Morgan George W 18
#5 Heredy Laszlo A 17
#6 Houk Richard D 17
#7 Cumming James C 15
#8 Pulliam George R 14
#9 Houk R 14
#10 Polkinghorn Robert W 14

Latest patents

Publication Filing date Title
AU8498675A Brake control system
AU7312174A Conatiner
DE2413015A1 ELECTRONIC FUEL INJECTION DEVICE
US3859222A Silicon nitride-silicon oxide etchant
CA954790A Underwater riser and ship connection
CA949877A Underwater riser and ship connection
US3858025A Pattern welding process and control device
DE2335597A1 RING LASER GYROSCOPE
US3819902A Pattern welding control device
DE2328164A1 Cleaning precision workpieces - using liquids whichvapourise easily removing impurities
CA939232A Single lever control unit for hydrostatic transmissions
CA970047A Phase-scanned radiating array
US3789221A Dye penetrant composition and method utilizing same
CA980998A Method of producing a mass unbalanced spherical gyroscope rotor
US3777157A Water washable dye penetrant composition and method of application
IL41298A Waveguide switch
US3808547A Automatic gain control circuit
ES409723A1 Procedure to provide a coating resistant to oxidation corrosión on a surface of a ferrous metal article. (Machine-translation by Google Translate, not legally binding)
AU5010072A Segmented hydraulic core clamp
CA959383A Thick oxide process for improving metal deposition and stability of semiconductor devices