| # | Country | Total Patents | |
|---|---|---|---|
| #1 | China | 54 |
| # | Industry | |
|---|---|---|
| #1 | Semiconductors | |
| #2 | Basic communication technologies | |
| #3 | Computer technology | |
| #4 | Environmental technology | |
| #5 | Audio-visual technology | |
| #6 | Optics | |
| #7 | Measurement | |
| #8 | Machine tools |
| # | Name | Total Patents |
|---|---|---|
| #1 | Hiroyuki Takahashi | 3 |
| #2 | Atsushi Nakagawa | 2 |
| #3 | Takashi Sako | 2 |
| #4 | Takuya Kitamura | 2 |
| #5 | Hideo Inaba | 2 |
| #6 | Naoyoshi Kawahara | 1 |
| #7 | Masatoshi Sonoda | 1 |
| #8 | Junji Orimoto | 1 |
| #9 | Kuniko Kikuta | 1 |
| #10 | Seiji Kumeta | 1 |
| Publication | Filing date | Title |
|---|---|---|
| CN1831651A | Method for providing layout design and photomask |