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KR20010008709A
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A low-voltage-operative non-volatile ferroelectric memory device with floating gate
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TW275703B
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Method of forming an insulating layer with contact holes in semiconductor device fabrication
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TW276390B
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Double four quadrant angle position detector
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TW276243B
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Method for producing ozone by electrolysis
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TW269077B
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Modulator
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Fabricating process for chip with fluoro-oxide
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Intermediate voltage sensors for CMOS circuits
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TW269655B
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Cooling device for laser processing and cooling process for work piece of laser processing
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Process for LCD TFT gate-bus line and gate dielectric
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TW270988B
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Vector summation device
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Process of producing ceramic elements by using injection formation
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Four quadrant multiplier
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TW267221B
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Same-line multiple access method of built-in memory
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TW267261B
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Manufacturing process for Mn-Al film
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Infrared sensor
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TW273640B
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Method for preventing PMOS from boron punch-through effect
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TW252249B
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Demodulation receiving system for estimating frequency shift and sampling error
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TW260832B
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Process of light frequency converter
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TW274147B
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Amorphous silicon thin film transistor structure and fabrication process thereof
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TW254013B
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Single rail up-down pass transistor logic
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