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NAT CT SCIENT RES DEMOKRITOS

Overview
  • Total Patents
    39
  • GoodIP Patent Rank
    235,161
About

NAT CT SCIENT RES DEMOKRITOS has a total of 39 patent applications. Its first patent ever was published in 1998. It filed its patents most often in WIPO (World Intellectual Property Organization), EPO (European Patent Office) and Australia. Its main competitors in its focus markets measurement, micro-structure and nano-technology and macromolecular chemistry and polymers are ETHNIKO KENTRO EREVNAS FYSIKON, NAT UNIV CORP TOKYO INST TECHNOLOGY and UNIV KING ABDULAZIZ.

Patent filings per year

Chart showing NAT CT SCIENT RES DEMOKRITOSs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Argitis Panagiotis 9
#2 Paleos Constantinos 8
#3 Tsiourvas Dimitrios 8
#4 Sideratou Oreozili 8
#5 Gogolides Evangelos 8
#6 Tserepi Angeliki 6
#7 Misiakos Konstantinos 5
#8 Kakabakos Sotirios 4
#9 Normand Pascal Jean Michel 4
#10 Tsoukalas Dimitris Konstantin 4

Latest patents

Publication Filing date Title
EP2918675A1 Gaseous plasma nanotextured substrates for selective enrichment of cancer cells
EP2044635A1 Tuning the emission color of single layer, patterned full color organic light emitting diodes
US2009005238A1 Modified Nanostructured Titania Materials and Methods of Manufacture
WO2006027631A1 Per-6-guanidino-, -aminoalkylamino-and -guanidino-alkylamino-cyclodextrins, methods of their synthesis and their use for the compaction of dna and interacellular delivery
WO2004072153A1 Multifunctional dendrimers and hyperbranched polymers as drug and gene delivery systems
CN1747988A Multifunctional dendrimers and hyperbranched polymers as drug and gene delivery systems
EP1552346A1 Lithographic materials based on polymers containing polyhedral oligomeric silsesquioxanes
WO03046527A1 Integrated optoelectronic silicon biosensor for the detection of biomolecules labeled with chromophore groups or nanoparticles
US7608389B2 Photoresists processable under biocompatible conditions for multi-biomolecule patterning
EP1241703A1 Method for masking silicon during anisotropic wet etching
EP1259976A2 Capacitive pressure-responsive devices and their fabrication
US6296989B1 Silylation of epoxy-containing photoresist films