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MITSUI CHEMICAL ANALYSIS & CON

Overview
  • Total Patents
    15
About

MITSUI CHEMICAL ANALYSIS & CON has a total of 15 patent applications. Its first patent ever was published in 2001. It filed its patents most often in Japan and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets environmental technology and basic materials chemistry are FOR SOLUTIONS IP LLC, BAKER HUGH G and ENV & RESOURCE TECH HOLDINGS.

Patent filings in countries

World map showing MITSUI CHEMICAL ANALYSIS & CONs patent filings in countries

Patent filings per year

Chart showing MITSUI CHEMICAL ANALYSIS & CONs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Yoneshige Yoshihiro 5
#2 Nakada Kota 4
#3 Yagi Tadashi 3
#4 Miyazaki Tetsuya 3
#5 Asanuma Tadashi 3
#6 Hamanaka Hidemichi 2
#7 Tashiro Koji 2
#8 Sekine Motoka 1
#9 Ikuta Yuriko 1
#10 Nakaura Makoto 1

Latest patents

Publication Filing date Title
JP2010000056A Method for monitoring preserved state of food, food storage, and system
JP2008304455A Measuring method of permeability
JP2009216425A Foreign matter analytical sample, and foreign matter analytical method
WO2008007421A1 Apparatus for evaluating biodegradability, apparatus for measuring carbon dioxide evolution and utilization of the same
JP2007319123A Apparatus for biodegradability evaluation
JP2007322223A Measuring instrument of occurring amount of carbon dioxide and measuring method using it
JP2007240359A Method for measuring cross-link density of cross-linked polymer
JP2007108156A Method for determining quantity of silicon in organic silicon compound
JP2007171006A Surface observation method using scanning probe atomic force microscope
JP2007051948A Analysis method of gas, and container
JP2005351838A Preparation method of aldehyde derivative and/or ketone derivative-containing solution and quantitative analyzing method of aldehyde and/or ketone
JP2005043246A Method of quantifying heavy metals in fluorocarbon resin
JP2003045927A Method for analyzing multilayer film on substrate surface for each layer
JP2003017538A Local analysis method of substrate surface
JP2002217163A Dissolving method of silicon layer formed on silicon wafer