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LEIBNIZ INST FUER OBERFLAECHEN

Overview
  • Total Patents
    12
About

LEIBNIZ INST FUER OBERFLAECHEN has a total of 12 patent applications. Its first patent ever was published in 2003. It filed its patents most often in Germany, Japan and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets machine tools, electrical machinery and energy and surface technology and coating are TOYOKOH CO LTD, CARBONE LORRAINE EQUIPEMENTS G and Jiangsu minsheng special equipment group co ltd.

Patent filings in countries

World map showing LEIBNIZ INST FUER OBERFLAECHENs patent filings in countries

Patent filings per year

Chart showing LEIBNIZ INST FUER OBERFLAECHENs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Schindler Axel 4
#2 Zimmer Klaus 4
#3 Boehme Rico 4
#4 Thomas Hans-Juergen 2
#5 Seidel Peter 2
#6 Nickel Andreas 2
#7 Boehm Georg 2
#8 Haensel Thomas 2
#9 Bucsi Istvan 2
#10 Frank Wilfried 2

Latest patents

Publication Filing date Title
DE102008008299B3 Latent photoactivatable precatalysts for metathesis polymerization
DE102007052969A1 Electrically contacting thin-film conducting webs to organic carrier by producing openings in dielectric carrier of thin-film circuits, comprises removing large part of thick material of the dielectric carrier on a rear side of circuit
DE102007033078A1 Polymeric carrier material for the cultivation of cells
DE102006002758A1 Selective removal process for silicium contamination involves directing cold plasma jet containing fluorine onto surface being cleaned
DE102005055174B3 Process for removing translucent materials with laser radiation and apparatus therefor
DE102005026334A1 Method for processing of medium- and long-wave surface shape of work piece e.g., for optical elements, involves eroding modified layers to give work piece modified surface
DE102005017632A1 Method for modifying the surface of a sample by means of a pulsed ion beam or by means of an ion beam-generated particle beam with a homogeneous or Gaussian distributed current density
DE102004002508A1 Arrangement for controlling and regulating the ion beam profile of Breitenstrahlquellen by clocked beamlet control
DE10328534A1 Device and method for laser ablation of transparent materials
DE10328559A1 Process for the precision machining of transparent materials with pulsed laser radiation