| # | Country | Total Patents | |
|---|---|---|---|
| #1 | China | 3 | |
| #2 | Japan | 3 | |
| #3 | United States | 3 | |
| #4 | Australia | 2 | |
| #5 | EPO (European Patent Office) | 2 | |
| #6 | Israel | 2 | |
| #7 | WIPO (World Intellectual Property Organization) | 2 |
| # | Industry | |
|---|---|---|
| #1 | Audio-visual technology | |
| #2 | Optics | |
| #3 | Measurement | |
| #4 | Textiles and paper |
| # | Technology | |
|---|---|---|
| #1 | Photomechanical semiconductor production | |
| #2 | Casings and printed circuits | |
| #3 | Television | |
| #4 | Testing of structures | |
| #5 | Optical systems | |
| #6 | Typewriters |
| # | Name | Total Patents |
|---|---|---|
| #1 | Battig Udo | 11 |
| #2 | Retschke Wolfgang | 10 |
| #3 | Senf Wolfgang | 10 |
| #4 | Klowsky Uwe | 9 |
| #5 | Baumann Ulrich | 9 |
| #6 | Ruecker Steffen | 9 |
| #7 | Gorlitz Volker | 2 |
| #8 | Rucker Steffen | 2 |
| #9 | Steffen Rucker | 1 |
| #10 | Uwe Klowsky | 1 |
| Publication | Filing date | Title |
|---|---|---|
| IL156357D0 | Direct pattern writer | |
| US6770866B2 | Direct pattern writer | |
| WO0055592A1 | Optical alignment and mounting system | |
| AU3414199A | Scanner system |