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KYOWA HAKKO CHEMICAL CO LTD

Overview
  • Total Patents
    181
About

KYOWA HAKKO CHEMICAL CO LTD has a total of 181 patent applications. Its first patent ever was published in 1997. It filed its patents most often in WIPO (World Intellectual Property Organization), Japan and EPO (European Patent Office). Its main competitors in its focus markets organic fine chemistry, basic materials chemistry and optics are GEIGY AG J R, ENICHIMICA SECONDARIA and PENNWALT CORP.

Patent filings per year

Chart showing KYOWA HAKKO CHEMICAL CO LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Shimizu Ikuo 40
#2 Yamano Junzo 29
#3 Kinugasa Motoharu 27
#4 Inayama Toshihiro 22
#5 Ukai Katsumi 22
#6 Hotta Iwao 21
#7 Ito Katsuhiro 21
#8 Matsuoka Hiroshi 21
#9 Hiyoshi Satoshi 20
#10 Isogai Yukihiro 20

Latest patents

Publication Filing date Title
TW201211233A Composition containing tetraester of pentaerythritol and diester of neopentyl Glycol
CN102958902A Tetraester of pentaerythritol
WO2011162190A1 Metal complexes of squarylium compounds and optical recording media comprising same
WO2011142329A1 Complex compound and optical recording medium containing same
WO2011118414A1 Oil additive containing phosphate ester compound
WO2011070859A1 Method for heating steel sheet for hot pressing use
WO2010093045A1 Oil additive comprising phosphoric ester compound
JP2011126815A Complex compound and optical recording medium containing the same
WO2010050387A1 Aqueous water-resistant coating material
WO2010047341A1 Metal complexes of squarylium compounds and optical recording media containing same
WO2010041691A1 Optical recording medium containing metal complex of squarylium compound
WO2010029945A1 Additive for oil and lubricating oil composition containing same
WO2009139433A1 Additive for oil and lubricant containing the same
JP2010242196A Method for producing hot press steel sheet
WO2009101885A1 Polyimide
JP2010024220A Auxiliary of film formation
WO2009081852A1 Protective agent
JP2010100669A Metal complex of squarilium compound, and optical recording medium using the same
JP2010091691A Positive radiation-sensitive resin composition
JP2010044222A Positive type radiation sensitive resin composition