KODAK GRAPHIC COMM GMBH has a total of 39 patent applications. Its first patent ever was published in 2000. It filed its patents most often in EPO (European Patent Office), United States and China. Its main competitors in its focus markets textiles and paper, optics and machines are TENG GARY GANGHUI, KODAK POLYCHROME GRAPHICS L L and KODAK POLYCHROME GRAPHICS JP.
# | Country | Total Patents | |
---|---|---|---|
#1 | EPO (European Patent Office) | 27 | |
#2 | United States | 5 | |
#3 | China | 3 | |
#4 | Germany | 3 | |
#5 | WIPO (World Intellectual Property Organization) | 1 |
# | Industry | |
---|---|---|
#1 | Textiles and paper | |
#2 | Optics | |
#3 | Machines | |
#4 | Audio-visual technology | |
#5 | Computer technology | |
#6 | Macromolecular chemistry and polymers |
# | Name | Total Patents |
---|---|---|
#1 | Baumann Harald | 15 |
#2 | Fiebag Ulrich | 11 |
#3 | Strehmel Bernd | 9 |
#4 | Savariar-Hauck Celin | 9 |
#5 | Dwars Udo | 8 |
#6 | Timpe Hans-Joachim | 6 |
#7 | Ebhardt Tanja | 6 |
#8 | Flugel Michael | 5 |
#9 | Frank Dietmar | 5 |
#10 | Moulin Michel | 4 |
Publication | Filing date | Title |
---|---|---|
EP2778782A1 | Negative working radiation-sensitive elements | |
EP1987396A1 | Uv-sensitive lithographic printing plate precursor with benzoxazole derivative and analogues thereof as sensitizer | |
US2008118868A1 | Multilayer element with low pH developer solubility | |
CN101287601A | Dual-layer heat-sensitive imageable elements with a polyvinyl acetal top layer | |
DE102005002754A1 | Phosphono-substituted siloxanes as interlayer for lithographic printing plates | |
DE102004012191A1 | Stable strong alkaline developer | |
EP1204003A1 | Process for developing exposed radiation-sensitive printing plate precursors | |
DE10022786A1 | On the printing machine developable printing plate |