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JAPAN NEW METALS CO LTD

Overview
  • Total Patents
    22
  • GoodIP Patent Rank
    198,340
  • Filing trend
    ⇩ 100.0%
About

JAPAN NEW METALS CO LTD has a total of 22 patent applications. It decreased the IP activity by 100.0%. Its first patent ever was published in 2000. It filed its patents most often in Japan, China and Republic of Korea. Its main competitors in its focus markets materials and metallurgy, surface technology and coating and environmental technology are GUANGDONG ZHENGXIN HARD MATERIAL TECH RESEARCH AND DEVELOPMENT CO LTD, US BRONZE POWDERS INC and KRATKY ANTON ING.

Patent filings in countries

World map showing JAPAN NEW METALS CO LTDs patent filings in countries
# Country Total Patents
#1 Japan 19
#2 China 1
#3 Republic of Korea 1
#4 United States 1

Patent filings per year

Chart showing JAPAN NEW METALS CO LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Iwamoto Kenji 8
#2 Morita Susumu 7
#3 Shimizu Hideaki 6
#4 Ibaraki Masayuki 5
#5 Izuhara Toshihisa 4
#6 Yasui Noboru 4
#7 Yoshimoto Hirobumi 3
#8 Ishita Mitsushi 2
#9 Hayashi Hiroyuki 2
#10 Ogura Junji 2

Latest patents

Publication Filing date Title
JP2018165391A Method for producing tungsten fine powder
JP2018165235A Particulate tungsten carbide powder
JP2018165234A Method for producing particulate tungsten carbide powder
JP2018165233A Method for producing fine tungsten carbide powder
JP2016169413A Coarse, uniform and spherical titanium silicide powder and method for manufacturing the same
JP2012046373A Method of manufacturing hetero poly molybdate with small grain size
JP2010121192A Composite powder and method for producing the same
JP2010115657A Binderless powder for surface hardening
JP2009007610A Composition gradient molybdenum-niobium alloy powder
JP2008303127A Method for producing titanium carbonitride powder
JP2007092089A Method for producing high-purity molybdenum-tungsten alloy powder used for raw powder for sputtering target
US2005061106A1 High purity metal Mo coarse powder and sintered sputtering target produced by thereof
JP2005314715A HIGH PURITY METAL Mo COARSE POWDER SUITABLY USED AS RAW MATERIAL POWDER FOR MANUFACTURING HIGH PURITY METAL Mo SINTERED TARGET FOR SPUTTERING
JP2005314714A HIGH PURITY METAL Mo COARSE POWDER SUITABLY USED AS RAW MATERIAL POWDER FOR MANUFACTURING HIGH PURITY METAL Mo SINTERED TARGET FOR SPUTTERING
JP2005307235A P conaining w powder, and sintered target for sputtering manufactured by using the same
JP2005133198A HIGH-PURITY HIGH-DENSITY METAL Mo SINTERING TARGET FOR SPUTTERING WHICH ENABLES FORMATION OF HIGH-PURITY METAL Mo THIN FILM PRODUCING EXTREMELY FEW PARTICLE
JP2005133197A HIGH-PURITY METAL Mo COARSE POWDER SUITABLE FOR RAW POWDER FOR MANUFACTURING HIGH-PURITY METAL Mo SINTERED TARGET FOR SPUTTERING
JP2003112916A Method for producing high purity pulverized carbonized tungsten powder without necessitating grinding process
JP2002241113A Method for manufacturing chromium nitride powder
JP2001354424A Method for manufacturing heteropolytungstic acid