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INST OBERFLAECHENMODIFIZIERUNG

Overview
  • Total Patents
    32
About

INST OBERFLAECHENMODIFIZIERUNG has a total of 32 patent applications. Its first patent ever was published in 1997. It filed its patents most often in Germany, EPO (European Patent Office) and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets basic materials chemistry, micro-structure and nano-technology and materials and metallurgy are CATALYSTS & CHEM IND CO, NANOPAC LTD and PIERCE & STEVENS CORP.

Patent filings in countries

World map showing INST OBERFLAECHENMODIFIZIERUNGs patent filings in countries

Patent filings per year

Chart showing INST OBERFLAECHENMODIFIZIERUNGs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Mehnert Reiner 11
#2 Glaesel Hans-Juergen 9
#3 Bigl Frieder 7
#4 Hartmann Eberhard 7
#5 Schindler Axel 4
#6 Buchmeiser Michael R 4
#7 Otte Karsten 3
#8 Zimmer Klaus 3
#9 Klenert Peter 3
#10 Braun Alexander 3

Latest patents

Publication Filing date Title
DE102006059216A1 Nano-powder exhibiting a spherical particle morphology, useful in nano-dispersions and polymer composites, comprises inorganic metal oxide- and metal mixed oxide
DE102006042063A1 Method for adjusting gloss level and haptic of decorative and functional surface, involves converting micro convolution image, gloss level and haptic by variation of holding time in period between convolution start to convolution ending
DE102006037931A1 Multilayer barrier
DE102005060198A1 Apparatus for carrying out a method for modifying surfaces of radiation-curable paints and lacquers by photochemical microfolding using short-wave monochromatic UV radiation under stable irradiation and inerting conditions
DE102005032353B3 Metalorganic nano-powder, useful in the preparation of polymer nano-dispersion and polymer composite, comprises an organo metallic composition
DE10210253A1 Cleaning semiconductor surface comprises heating surface, and subjecting surface to hydrogen ion beam having specified ion energy
DE10164112A1 Defect analysis of reflective optic surfaces, especially masks for extreme UV lithography, whereby the surface is irradiated to produce a standing wave system and resultant emitted electrons or fluorescence evaluated
DE10026960A1 Method for attenuating a guided in an optical beam light flux
DE19961632A1 Surface coating kit, radiation-curable coating agent and process for producing scratch-resistant, abrasion-resistant and adhesive coatings
DE19925790A1 High rate processing of material surfaces especially in optical applications, microelectronics or in microsystems comprises using a plasma beam source
DE19920693C1 Open UV / VUV excimer lamp and process for surface modification of polymers
DE19919009A1 Mask and its application in laser ablation
DE19912054A1 Printing and laminating of flexible materials is carried out in a continuous process, by using ink and adhesives that can be hardened by UV radiation
DE19850027A1 Process to optimize the supply of inert gas to a printing process prevents disruption to hardening of printing inks, adhesive hardening and binding agents
DE19850028A1 Non-contact hood retains inert gas over a print surface positioned axially
DE19846660A1 Polymerizable metal oxide particles, e.g. useful in coating compositions, adhesives or sealants, comprise a metal oxide core functionalized with reactive groups
DE19844025A1 Reactive ion or ion beam etching quartz or quartz glass for shaping or structuring, uses a fluorine-containing etching gas and a further fluorine- and/or hydrogen-containing gas in equipment made of inert materials
DE19841125A1 Positioning living cells within a 3-dimensional microstructure with movement-limiting openings, especially useful for study by atomic force microscopy
DE19829760A1 Coaxial microwave applicator for generating a plasma with automatic or manual adjustment
DE19814760A1 Ion beam machining process for surface leveling, shaping or shape correction of mechanical, micromechanical, electronic and high quality optical components