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INST KHIM VYSOKOCHISTYKH VESHC

Overview
  • Total Patents
    16
About

INST KHIM VYSOKOCHISTYKH VESHC has a total of 16 patent applications. Its first patent ever was published in 1988. It filed its patents most often in Russian Federation and USSR (Union of Socialist Soviet Republics). Its main competitors in its focus markets materials and metallurgy, surface technology and coating and machines are SEEMAN THOMAS A, JUNG LOTHAR and PLASMA OPTICAL FIBRE BV.

Patent filings in countries

World map showing INST KHIM VYSOKOCHISTYKH VESHCs patent filings in countries

Patent filings per year

Chart showing INST KHIM VYSOKOCHISTYKH VESHCs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Devyatykh Grigorij G 6
#2 Vorotyntsev Vladimir M 4
#3 Moiseev Aleksandr Nikolaevich 3
#4 Kraev Igor Aleksandrovich 3
#5 Chiljasov Aleksej Viktorovich 2
#6 Gusev A V 2
#7 Devjatykh G G 2
#8 Prokhorov A M 2
#9 Dorofeev Vitalij Vital Evich 2
#10 Prokhorov Aleksandr M 2

Latest patents

Publication Filing date Title
RU2370576C1 Method of growth of mono crystals out of isotope enriched silicon
RU2342323C1 Method of tungsten hexafluoride purification
RU2341461C1 Method of obtaining high-purity tungsten oxide (iv)
RU2338014C2 Method of zinc selenide optic elements processing
RU2301197C1 Method for purifying tellurium dioxide
RU2155158C1 METHOD OF PREPARING MONOISOTOPIC SILICON Si28
RU2142909C1 Method of production of high-purity trichlorosilane and device for realization of this method
RU95101425A Method of determination of gas-forming impurities in solid highly pure substances
RU2038297C1 Method of trichlorosilane synthesis
RU2071993C1 Method of germanium hydride producing
RU2041209C1 Method of synthesis of dialkylmonotellurides
RU2046843C1 Method of producing polycrystalline zinc selenide
SU1766854A1 Preparation
SU1755133A1 Method of sample preparation in atomic absorption analysis of ultrapure zinc oxide
SU1686280A1 Cryostat for investigating electrophysical properties of semiconductive material
RU2038841C1 Method of production of filter medium from silicon dioxide for cleaning of gases and liquids