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HWANG KI WOONG

Overview
  • Total Patents
    19
About

HWANG KI WOONG has a total of 19 patent applications. Its first patent ever was published in 1993. It filed its patents most often in Republic of Korea and WIPO (World Intellectual Property Organization). Its main competitors in its focus markets electrical machinery and energy, audio-visual technology and semiconductors are LG ELECTRONICS NANJING PLASMA, IMAGING SYSTEMS TECHNOLOGY and ACER DISPLAY TECH INC.

Patent filings in countries

World map showing HWANG KI WOONGs patent filings in countries

Patent filings per year

Chart showing HWANG KI WOONGs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Hwang Ki Woong 14
#2 Hwang Ki-Woong 5
#3 Kim Jae Sung 3
#4 Kim Joong Kyun 2
#5 Yeon Choong-Kyu 2
#6 Yang Jin Ho 2
#7 Lee Byon-Gll 1
#8 Yoon Cha Keun 1
#9 Lee Ho-Jun 1
#10 Jung U Jun 1

Latest patents

Publication Filing date Title
WO2009048294A2 Magnetized inductively coupled plasma processing apparatus and generating method
KR20040048817A Method for driving plasma display panel
KR20050035801A Driving method for plasma display panel
KR20050007507A Ac plasma display panel having high luminous efficacy
KR20040050976A Driving method for decreasing address period in plasma display panel
KR20040047142A High efficiency ac plasma display panel having low sustain voltage and long discharge path
KR20030064443A Method for driving plasma display panel
KR20020000706A an AC plasma display panel having delta color pixels of closed shape subpixels
KR20020019342A a for low voltage-driving ac PDP and method therefor
KR20010017599A a scan driver for a AC plasma display panel
KR20010002655A Apparatus for firing and sealing plasma display pannel using halogen lamp and Method for firing and sealing plasma display pannel using the same
KR20000073134A A method for driving a PDP
KR100321860B1 Four-electrode ac type plasma display panel
KR100299529B1 Dichroic mirror for plasma display panel
KR100188520B1 Multi-electrode sputtering and sputtering apparatus to prevent small particle pollution
KR100222597B1 Method for preventing small particle growth in rie-type silicon oxide etching device
KR100210007B1 Helical-type antenna for generating helicon plasma
KR0178847B1 Planar type high frequency induction coupled plasma processing apparatus with external magnetic field
KR970003354B1 The structure of plasma display panel