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HUNT CHEM CORP PHILIP A

Overview
  • Total Patents
    139
About

HUNT CHEM CORP PHILIP A has a total of 139 patent applications. Its first patent ever was published in 1964. It filed its patents most often in United States, Canada and France. Its main competitors in its focus markets optics, surface technology and coating and macromolecular chemistry and polymers are ROTH CHRISTOPH, KONISHIROKU PHOTO IND and OLIN HUNT SPECIALTY PROD.

Patent filings in countries

World map showing HUNT CHEM CORP PHILIP As patent filings in countries

Patent filings per year

Chart showing HUNT CHEM CORP PHILIP As patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Kroll Harry 17
#2 Sykes Donald J 12
#3 Finch Theron R 9
#4 Kosel George E 8
#5 Toukhy Medhat A 6
#6 Campbell Roderick A 4
#7 Bulloch David K 4
#8 Murski Kenneth J 4
#9 Czirr David L 4
#10 Ebersole Charles E 4

Latest patents

Publication Filing date Title
CA1294425C Electroplating process
US4650745A Method of forming a resist pattern by radiation exposure of positive-working resist coating comprising a dye and a trihydroxybenzophenone compound and subsequent aqueous alkaline development
JPS62133099A Electroplating of conductive metal layer to surface of non-conductive substance
US4565776A Photographic developer composition
EP0146811A2 High-temperature films and coating solutions for use in the manufacture of semi-conductor integrated circuits
US4587196A Positive photoresist with cresol-formaldehyde novolak resin and photosensitive naphthoquinone diazide
EP0135900A2 Aqueous developable negative resist compositions
US4617252A Antireflective coatings for use in the manufacture of semi-conductor devices, methods and solutions for making such coatings, and the method for using such coatings to absorb light in ultraviolet photolithography processes
IE822825L Herbicidal phosphonoalkanoic acids
ZA8208650B Herbicidal compositions and method using phosphonalkanoic acids, esters and salts thereof
US4529682A Positive photoresist composition with cresol-formaldehyde novolak resins
JPS5817112A Positive novolak photoresist composition and blend
EP0070624A1 Novolak resin and a positive photoresist composition containing the same
JPS57171331A Composition of negative photo-resist forming cyclic rubber film
US4377631A Positive novolak photoresist compositions
US4319955A Ammoniacal alkaline cupric etchant solution for and method of reducing etchant undercut
US4311551A Composition and method for etching copper substrates
AU5247979A Liquid development of electrostaic images
US4268597A Method, apparatus and compositions for liquid development of electrostatic images
NL7901793A Colour developing soln. for high speed reversal film - contains competing coupler comprising citrazinic acid, ethylene di:amine, borane deriv. etc.