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HUBEI SINOPHORUS ELECTRONIC MAT CO LTD

Overview
  • Total Patents
    44
  • GoodIP Patent Rank
    34,254
About

HUBEI SINOPHORUS ELECTRONIC MAT CO LTD has a total of 44 patent applications. Its first patent ever was published in 2016. It filed its patents most often in China. Its main competitors in its focus markets basic materials chemistry, materials and metallurgy and surface technology and coating are CARBONISATION ET CHARBONS ACTIFS S A, HALL LAB and VECHT ARON.

Patent filings in countries

World map showing HUBEI SINOPHORUS ELECTRONIC MAT CO LTDs patent filings in countries
# Country Total Patents
#1 China 44

Patent filings per year

Chart showing HUBEI SINOPHORUS ELECTRONIC MAT CO LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Li Shaoping 37
#2 Zhang Ting 36
#3 He Zhaobo 36
#4 Feng Kai 35
#5 Wang Shuping 35
#6 Yin Yin 34
#7 Wan Yangyang 30
#8 Zhang Yanzhe 24
#9 Cai Bulin 24
#10 Hao Xiaobin 16

Latest patents

Publication Filing date Title
CN112280558A Silicon wafer roughening liquid
CN112251233A Silicon etching solution for removing grinding lines
CN112142068A Method for producing high-purity ammonium chloride from industrial-grade ammonium chloride
CN111960394A Method for recycling waste aluminum etching liquid
CN111519190A Etching solution for stabilizing etching cone angle in copper process panel and stabilizing method
CN111472003A Etching solution for adjusting etching cone angle in copper process panel and adjusting method
CN111647888A Copper etching solution with long etching life
CN111647889A Copper etching solution with stable etching rate
CN111471463A Etching solution for silicon dioxide film
CN110885979A Slow-release silicon spot etching agent
CN111019659A Selective silicon etching liquid
CN110980657A Sulfuric acid production device and method for reducing electronic-grade sulfuric acid oxidizable substances
CN111020589A Device and method for recycling aluminum etching liquid
CN110907509A Method for detecting hydrofluoric acid in electronic-grade mixed acid
CN110846040A High-silicon-content phosphate etching solution and preparation method thereof
CN110804441A Phosphoric acid etching solution for inhibiting silicon dioxide etching
CN110878208A Acidic etching solution for improving silicon nitride etching uniformity
CN110727182A Method for stripping photoresist
CN110763749A Method for detecting fluorine ions in acid-containing etching solution
CN110644001A Copper etching solution