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HUBEI GURUN TECH CO LTD

Overview
  • Total Patents
    40
  • GoodIP Patent Rank
    38,343
  • Filing trend
    ⇧ 220.0%
About

HUBEI GURUN TECH CO LTD has a total of 40 patent applications. It increased the IP activity by 220.0%. Its first patent ever was published in 2016. It filed its patents most often in China, WIPO (World Intellectual Property Organization) and Brazil. Its main competitors in its focus markets macromolecular chemistry and polymers, organic fine chemistry and basic materials chemistry are TIANJIN JIURI CHEMICAL CO LTD, INSIGHT HIGH TECHNOLOGY JIANGSU CO LTD and ADVANCED SYNTECH LLC.

Patent filings per year

Chart showing HUBEI GURUN TECH CO LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Zou Yingquan 36
#2 Pang Yulian 26
#3 Fan Shuheng 11
#4 Xin Yangyang 6
#5 Ma Haoqin 6
#6 Sun Fang 6
#7 Gao Ming 6
#8 Wang Zheng 5
#9 Guo Yejia 5
#10 Yulian Pang 4

Latest patents

Publication Filing date Title
CN112279864A Bifunctional coumarin oxime ester compound and preparation and application thereof
CN112094365A Photocurable composition containing infrared absorbing photosensitizer, initiator, and alkenyl ether and/or oxetane compound
CN111454598A Light-cured composition suitable for irradiation curing of near-infrared L ED light source and application thereof
CN111302926A β -diketone cerium (IV) compound and preparation and application thereof
CN110330501A Long wavelength's cumarin oxime ester compound and its preparation and application
WO2020258014A1 Long-wavelength coumarin oxime ester compound, preparation therefor, and application thereof
CN112111063A Polysiloxane-containing oxetane monomer and preparation and application thereof
CN112111064A Hetero-photo-curable polysiloxane-containing oxetane monomer and preparation and application thereof
CN112111062A Silicon-containing monomer containing dioxygen heterocycle and preparation and application thereof
CN110551098A oxime ester photoinitiator containing five-membered aromatic heterocyclic structure and preparation and application thereof
WO2020252628A1 Oxime ester photoinitiators containing five-membered heteroaromatic ring structure, and preparation and use thereof
CN111362890A Fluorine-containing cationic polymerization monomer and synthesis and application thereof
CN111057027A Fluorine-containing cationic polymerization monomer and synthesis and application thereof
CN108794333A The method for preparing cinnamic acid benzoyl first ester type compound
CN108912170A Prepare the method for alkyl halogenation phosphine and the reactor for this method
CN108303851A Include photoetching compositions of the poly(4-hydroxystyrene) class oxetane resin as film-forming resin
CN108255018A Include photoetching compositions poly(4-hydroxystyrene) based epoxy resin as film-forming resin
CN109134537A The method for preparing the oxetanes based compound of TPO based compound co-production 3- hydroxyalkyl substitution
CN108864341A Poly(4-hydroxystyrene) based epoxy resin, its synthesis and application
CN108864326A Photocurable composition and its application