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HUAHONG NEC ELECTRONICS CO LTD

Overview
  • Total Patents
    121
About

HUAHONG NEC ELECTRONICS CO LTD has a total of 121 patent applications. Its first patent ever was published in 2002. It filed its patents most often in China. Its main competitors in its focus markets semiconductors and environmental technology are HEZEL RUDOLF, CROSSLUX and BEIJING HONGTAI INNOVATION TECH CO LTD.

Patent filings in countries

World map showing HUAHONG NEC ELECTRONICS CO LTDs patent filings in countries
# Country Total Patents
#1 China 121

Patent filings per year

Chart showing HUAHONG NEC ELECTRONICS CO LTDs patent filings per year from 1900 to 2020

Focus industries

Top inventors

# Name Total Patents
#1 Xu Xiangming 6
#2 Xiangming Xu 5
#3 Jianhong Wu 4
#4 Wensheng Qian 3
#5 Xu Xiangming Li 3
#6 Junzhi Sang 3
#7 Wu Hong Chen 3
#8 Qian Wensheng 3
#9 Xu Xiangming Gong 3
#10 Wang Fei Zheng 2

Latest patents

Publication Filing date Title
CN1988158A Flat plate capacitor and its realizing method
CN1988150A Static discharging protective element structure for improving trigger effect
CN1988372A Sleeve type amplifier
CN1988147A Semiconductor alignment detecting structure
CN1988122A Method for marking silicon sheet edge
CN1988180A Schottky diode
CN1988115A Method for producing programmable device
CN1983598A Semiconductor capacity
CN1983588A Anti-electrostatic protecting structure by NMOS
CN1982910A Method for testing EFlash serial interface based on selective bit number
CN1983631A MOS field effective pipe and its production
CN1983629A High-voltage MOS pipe grid oxydic film structure and its growth
CN1981990A Chemical-mechanical polishing grinding pad
CN1982213A Nozzle of polycrystalline-silicon furnace
CN1982907A Method for testing transistor life
CN1983520A Production of semiconductor anti-reflective layer
CN1983528A Method for decreasing MOS field effect pipe reversed narrow channel effect
CN1983523A Method for decreasing inleakage at STI bottom by high-voltage MOS process
CN1982902A Method for analyzing BEOL testing chip on-line failure
CN1983032A Scale and method for measuring photoetching alignment precision