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HIRAI TOSHIO

Overview
  • Total Patents
    24
About

HIRAI TOSHIO has a total of 24 patent applications. Its first patent ever was published in 1975. It filed its patents most often in Japan and United States. Its main competitors in its focus markets materials and metallurgy, surface technology and coating and machines are PURAKUSUEA S T TECHNOL INC, SERMATECH INTERNAT INC and SERMATECH INT INC.

Patent filings in countries

World map showing HIRAI TOSHIOs patent filings in countries
# Country Total Patents
#1 Japan 21
#2 United States 3

Patent filings per year

Chart showing HIRAI TOSHIOs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Hirai Toshio 24
#2 Goto Takashi 7
#3 Hayashi Shinsuke 5
#4 Kishi Matsuo 3
#5 Okubo Akira 3
#6 Moritoki Masato 2
#7 Sasaki Makoto 2
#8 Nakao Noboru 2
#9 Gotou Takashi 2
#10 Ogawa Kenichi 2

Latest patents

Publication Filing date Title
JP2006230439A Disaster prevention tsunami cushion
JP2001151578A Porous silicon carbide sintered compact and method of producing the same
JPH1131626A Transformer
JPH10167359A Collar shape keeper
JPH05156447A Production of high density carbonaceous material
JPH05345977A Production and apparatus for producing functionally gradient material
JPH03155173A Thermoelectric transducer
JPH02217395A Massive body of crystalline silicone nitride
JPH02217394A Massive body of crystalline silicon nitride
JPH02120213A Silicon nitride block
JPH02219285A Thermoelectric material
JPH02205001A Resistor
JPH02194501A Resistor
JPH01123073A Surface coated member
JPS63274665A Polycrystalline ceramics having plastic deformability
JPS62263970A Crystalline ceramics excellent in wear resistance at high temperature and its production
JPS62263969A Crystalline ceramics excellent in wear resistance at high temperature and its production
JPS58145665A Si3n4-bn amorphous material and manufacture
JPS5747706A Lump of silicon nitride containing ti and its manufacture
JPS5617988A Electroconductive si3n44c type noncrystalline material by chemical gas phase deposition and its manufacture