Learn more

FUTURE VISION KK

Overview
  • Total Patents
    68
About

FUTURE VISION KK has a total of 68 patent applications. Its first patent ever was published in 2003. It filed its patents most often in Japan and China. Its main competitors in its focus markets semiconductors, optics and electrical machinery and energy are FUTURE VISION INC, MORIWAKI HIROYUKI and HARA YOSHIHITO.

Patent filings in countries

World map showing FUTURE VISION KKs patent filings in countries
# Country Total Patents
#1 Japan 65
#2 China 3

Patent filings per year

Chart showing FUTURE VISION KKs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Abe Makoto 13
#2 Yoshimoto Yoshikazu 11
#3 Muraoka Yusuke 10
#4 Tsutsui Yoshitaka 9
#5 Tanaka Tsutomu 9
#6 Miyaji Yasuyoshi 7
#7 Kaneko Hironori 5
#8 Iwabuchi Katsuhiko 5
#9 Suzuki Takaaki 5
#10 Kobayashi Satoki 5

Latest patents

Publication Filing date Title
JP2010277613A Method for recording and reproducing conference content
JP2009301047A Liquid crystal display
JP2008304182A Intake/exhaust method of substrate baking furnace
JP2009230267A Conference room equipment and conference recording system using the same
JP2008304892A Liquid crystal display device and method for manufacturing the same
JP2008276085A Liquid crystal display panel
JP2008277674A Thin film transistor and manufacturing method thereof, and liquid crystal display panel using the film transistor
JP2008102485A Method of manufacturing liquid crystal display panel, and liquid crystal display panel
JP2008202875A Heat exchanger
JP2008130677A Substrate carrying equipment
JP2008088510A Treatment liquid supply apparatus
JP2008065012A Liquid crystal display panel
JP2008066494A Manufacturing method of liquid crystal display panel, and liquid crystal display panel
JP2008066358A Liquid crystal display panel, and manufacturing method thereof
JP2008033037A Liquid crystal display device
JP2008009214A Display device reduced in chromaticity difference of white color and its manufacturing method
JP2008004898A Substrate transport apparatus, substrate transport method, and substrate processing system
JP2008002766A Air supply and exhaust system for substrate calcination furnace
JP2007281010A Substrate stage, and device and method of processing substrate using same
JP2007270162A Rotary magnet type sputtering system