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FUJIAN ACETRON NEW MAT CO LTD

Overview
  • Total Patents
    55
  • GoodIP Patent Rank
    26,928
  • Filing trend
    ⇧ 33.0%
About

FUJIAN ACETRON NEW MAT CO LTD has a total of 55 patent applications. It increased the IP activity by 33.0%. Its first patent ever was published in 2015. It filed its patents most often in China. Its main competitors in its focus markets materials and metallurgy, surface technology and coating and machine tools are VITAL THIN FILM MAT GUANGDONG CO LTD, SERAM COATINGS AS and HERAEUS GMSI LLC.

Patent filings in countries

World map showing FUJIAN ACETRON NEW MAT CO LTDs patent filings in countries
# Country Total Patents
#1 China 55

Patent filings per year

Chart showing FUJIAN ACETRON NEW MAT CO LTDs patent filings per year from 1900 to 2020

Top inventors

# Name Total Patents
#1 Zhang Ke 41
#2 Chen Qinzhong 29
#3 Cai Xiaoyong 18
#4 Li Qiang 16
#5 Lin Zhihe 13
#6 Chi Minghao 9
#7 Ye Kaiman 8
#8 Li Kang 7
#9 Zhang Yu 7
#10 Wu Rongzhen 7

Latest patents

Publication Filing date Title
CN112045309A Preparation method of water path back plate for target
CN112063986A Target binding method
CN111636055A Aluminum-scandium alloy sputtering target material with uniform components and preparation method thereof
CN111607768A Planar target material unbinding device and method
CN111485207A Fine-grain homogeneous high-scandium-content aluminum-scandium alloy sintering target material and preparation method and application thereof
CN111636054A Preparation method of aluminum-scandium alloy sputtering target material
CN111607798A Cleaning method for aluminum target material reverse sputtering film
CN111500993A Automatic target binding method
CN111632730A Extrusion grinding equipment and method for recycling ITO powder from ITO residual target/waste target
CN111620367A Method for recovering ITO powder from ITO residual target/waste target
CN111606704A ITO evaporation material and preparation method thereof
CN111599673A Grinding and polishing method of molybdenum wafer
CN111592339A ITO target material and preparation method thereof
CN111593306A End-reinforced rotary target and preparation method thereof
CN111453764A Method for recovering ITO powder from ITO evaporation material cutting waste liquid
CN111593216A Aluminum-scandium alloy target material, preparation method and application thereof, and vacuum consumable arc furnace
CN111606353A Method for recovering ITO powder from ITO target grinding waste liquid
CN111590071A Molybdenum-niobium alloy target material and preparation method thereof
CN111500992A Aluminum-scandium alloy target blank and preparation method and application thereof
CN111548144A ITO sputtering target material not prone to nodulation and preparation method thereof