CN104693100A
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Bishydrazide and amidonaphthalene structure containing compound and use thereof
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CN104693098A
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Bishydrazide and nitro-naphthyl structure containing compound as well as preparation method and use thereof
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CN104693101A
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Bishydrazide derivative as well as preparation method and use thereof
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CN104693095A
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Bishydrazide FXa inhibitor and use thereof
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CN104693097A
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Bishydrazide and alkoxy-naphthyl structure containing compound as well as preparation method and use thereof
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CN104693102A
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Bishydrazide compound as well as preparation method and use thereof
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CN104693099A
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Bishydrazide and naphthyl structure containing compound and use thereof
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CN104693094A
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Bishydrazide FXa inhibitor as well as preparation method and use thereof
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CN104693103A
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Bishydrazide compound and use thereof
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CN104693093A
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Bishydrazide FXa inhibitor and preparation method and use thereof
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CN104693096A
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Bishydrazide and naphthyl structure containing compound as well as preparation method and use thereof
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CN104693085A
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Halogeno-benzene containing N-phenyl adamantane amide compound and preparation method and use thereof
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CN104693084A
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Nitrilylphenyl-containing N-adamantane amide compound and preparation method and use thereof
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CN104693172A
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Phenyl thiophene amide SGLT2/SGLT1 double-target-point inhibitor and use thereof
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CN104693169A
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Nitro substituted methoxyphenyl thiophene amide double-target-point inhibitor and use thereof
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CN104693171A
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Methoxyphenyl-containing thiophene amide structured double-target-point inhibitor and use thereof
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CN104693170A
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Alkoxy thiophene amide double-target-point inhibitor and use thereof
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CN104693168A
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Nitrilyl thiophene amide toluene double-target-point inhibitor and use thereof
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