FOCUS EBEAM TECH BEIJING CO LTD has a total of 24 patent applications. It decreased the IP activity by 50.0%. Its first patent ever was published in 2017. It filed its patents most often in WIPO (World Intellectual Property Organization), United States and EPO (European Patent Office). Its main competitors in its focus markets electrical machinery and energy, measurement and optics are VESTAL MARVIN L, PHOTO ELECTRON SOUL INC and SANYU ELECTRON CO LTD.
# | Country | Total Patents | |
---|---|---|---|
#1 | WIPO (World Intellectual Property Organization) | 10 | |
#2 | United States | 7 | |
#3 | EPO (European Patent Office) | 5 | |
#4 | China | 1 | |
#5 | Israel | 1 |
# | Industry | |
---|---|---|
#1 | Electrical machinery and energy | |
#2 | Measurement | |
#3 | Optics |
# | Technology | |
---|---|---|
#1 | Electric discharge tubes | |
#2 | Analysing materials | |
#3 | Optical systems |
# | Name | Total Patents |
---|---|---|
#1 | Li Shuai | 23 |
#2 | He Wei | 22 |
#3 | Wang Peng | 6 |
#4 | Liu Sha | 1 |
Publication | Filing date | Title |
---|---|---|
WO2021068736A1 | Scanning electron microscope | |
US2021066031A1 | Scanning electron microscope with composite detection system and specimen detection method | |
WO2020019409A1 | Imaging system and method for specimen detection | |
WO2019100600A1 | Low voltage scanning electron microscope and method for specimen observation | |
EP3360152A1 | Vacuum condition processing apparatus, system and method for specimen observation | |
US2019295808A1 | Magnetic lens and exciting current control method | |
WO2018068506A1 | Charged particle beam system, opto-electro simultaneous detection system and method | |
US2020035448A1 | Vacuum condition controlling apparatus, system and method for specimen observation |